scholarly journals Precise Potential Observation of a Biased GaAs p-n Junction by in situ Phase-shifting Electron Holography

Materia Japan ◽  
2019 ◽  
Vol 58 (2) ◽  
pp. 101-101
Author(s):  
Satoshi Anada ◽  
Kazuo Yamamoto ◽  
Tsukasa Hirayama ◽  
Hirokazu Sasaki ◽  
Yujin Hori ◽  
...  
Microscopy ◽  
2020 ◽  
Author(s):  
Kazuo Yamamoto ◽  
Satoshi Anada ◽  
Takeshi Sato ◽  
Noriyuki Yoshimoto ◽  
Tsukasa Hirayama

Abstract Phase-shifting electron holography (PS-EH) is an interference transmission electron microscopy technique that accurately visualizes potential distributions in functional materials, such as semiconductors. In this paper, we briefly introduce the features of the PS-EH that overcome some of the issues facing the conventional EH based on Fourier transformation. Then, we present a high-precision PS-EH technique with multiple electron biprisms and a sample preparation technique using a cryo-focused-ion-beam, which are important techniques for the accurate phase measurement of semiconductors. We present several applications of PS-EH to demonstrate the potential in organic and inorganic semiconductors and then discuss the differences by comparing them with previous reports on the conventional EH. We show that in situ biasing PS-EH was able to observe not only electric potential distribution but also electric field and charge density at a GaAs p-n junction and clarify how local band structures, depletion layer widths, and space charges changed depending on the biasing conditions. Moreover, the PS-EH clearly visualized the local potential distributions of two-dimensional electron gas (2DEG) layers formed at AlGaN/GaN interfaces with different Al compositions. We also report the results of our PS-EH application for organic electroluminescence (OEL) multilayers and point out the significant potential changes in the layers. The proposed PS-EH enables more precise phase measurement compared to the conventional EH, and our findings introduced in this paper will contribute to the future research and development of high-performance semiconductor materials and devices.


2012 ◽  
Vol 18 (S2) ◽  
pp. 1292-1293 ◽  
Author(s):  
T. Tanji ◽  
A.H. Tavabi

Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.


2002 ◽  
Vol 8 (S02) ◽  
pp. 24-25
Author(s):  
K. Yamamoto ◽  
T. Hirayama ◽  
T. Tanji ◽  
M. Hibino

2010 ◽  
Vol 16 (S2) ◽  
pp. 576-577
Author(s):  
L Huang ◽  
Y Zhu

Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.


2011 ◽  
Vol 17 (S2) ◽  
pp. 484-485 ◽  
Author(s):  
A Tavabi ◽  
T Tanji

Extended abstract of a paper presented at Microscopy and Microanalysis 2011 in Nashville, Tennessee, USA, August 7–August 11, 2011.


Microscopy ◽  
2019 ◽  
Vol 69 (1) ◽  
pp. 1-10 ◽  
Author(s):  
Kazuo Yamamoto ◽  
Kiyotaka Nakano ◽  
Atsushi Tanaka ◽  
Yoshio Honda ◽  
Yuto Ando ◽  
...  

Abstract Phase-shifting electron holography (PS-EH) using a transmission electron microscope (TEM) was applied to visualize layers with different concentrations of carriers activated by Si (at dopant levels of 1019, 1018, 1017 and 1016 atoms cm−3) in n-type GaN semiconductors. To precisely measure the reconstructed phase profiles in the GaN sample, three electron biprisms were used to obtain a series of high-contrast holograms without Fresnel fringes generated by a biprism filament, and a cryo-focused-ion-beam (cryo-FIB) was used to prepare a uniform TEM sample with less distortion in the wide field of view. All layers in a 350-nm-thick TEM sample were distinguished with 1.8-nm spatial resolution and 0.02-rad phase-resolution, and variations of step width in the phase profile (corresponding to depletion width) at the interfaces between the layers were also measured. Thicknesses of the active and inactive layers at each dopant level were estimated from the observed phase profile and the simulation of theoretical band structure. Ratio of active-layer thickness to total thickness of the TEM sample significantly decreased as dopant concentration decreased; thus, a thicker TEM sample is necessary to visualize lower carrier concentrations; for example, to distinguish layers with dopant concentrations of 1016 and 1015 atoms cm−3. It was estimated that sample thickness must be more than 700 nm to make it be possible to detect sub-layers by the combination of PS-EH and cryo-FIB.


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