High aspect / narrow pitch substrate wiring and bump formation using imprinting technology for low temperature flip chip bonding

Author(s):  
Hiroshi Komatsu ◽  
Daisuke Sakai ◽  
Nozomi Shimoishizaka ◽  
Toshihiro Yamada
Author(s):  
Akiko Okada ◽  
Masatsugu Nimura ◽  
Naoko Unami ◽  
Akitsu Shigetou ◽  
Hirokazu Noma ◽  
...  

Author(s):  
Eiji Higurashi ◽  
Masao Nakagawa ◽  
Tadatomo Suga ◽  
Renshi Sawada

This paper reports the results of low-temperature flip-chip bonding of a vertical cavity surface emitting laser (VCSEL) on a micromachined Si substrate. Low temperature bonding was achieved by introducing the surface activation by plasma irradiation into the flip-chip bonding process. After the surfaces of the Au electrodes of the VCSEL and Si substrate were cleaned using an Ar radio frequency (RF) plasma, Au-Au bonding was carried out only by contact in ambient air with applied static pressure. At a bonding temperature of 100°C, the die-shear strength exceeded the failure criteria of MIL-STD-883.


2014 ◽  
Vol 53 (4S) ◽  
pp. 04EB04 ◽  
Author(s):  
Bui Thanh Tung ◽  
Fumiki Kato ◽  
Naoya Watanabe ◽  
Shunsuke Nemoto ◽  
Katsuya Kikuchi ◽  
...  

2012 ◽  
Vol 22 (9) ◽  
pp. 454-458 ◽  
Author(s):  
Won-Jung Choi ◽  
Se-Hoon Yoo ◽  
Hyo-Soo Lee ◽  
Mok-Soon Kim ◽  
Jun-Ki Kim

2018 ◽  
Vol 47 (10) ◽  
pp. 5952-5958 ◽  
Author(s):  
Weixin Fu ◽  
Tatsushi Kaneda ◽  
Akiko Okada ◽  
Kaori Matsunaga ◽  
Shuichi Shoji ◽  
...  

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