scholarly journals Oxygen Ion Beam Etching of Single Crystal Diamond Chips Using an ECR-type Ion Source.

1996 ◽  
Vol 62 (10) ◽  
pp. 1459-1463 ◽  
Author(s):  
Shuji KIYOHARA ◽  
Iwao MIYAMOTO
Keyword(s):  
Single Crystal ◽  
Ion Beam ◽  
Ion Source ◽  
Ion Beam Etching ◽  
Oxygen Ion ◽  
Single Crystal Diamond

Hydrogen Ion Beam Processing of Single Crystal Diamond Chips

1994 ◽  
Vol 354 ◽  
Author(s):  
Shuji Kiyohara ◽  
Iwao Miyamoto
Keyword(s):  
Surface Roughness ◽  
Single Crystal ◽  
Incidence Angle ◽  
Ion Beam ◽  
Etching Rate ◽  
Hydrogen Ion ◽  
Hydrogen Ions ◽  
Ion Beam Etching ◽  
Single Crystal Diamond ◽  
Before And After

AbstractIn order to apply ion beam etching with hydrogen ions to the ultra-precision processing of diamond tools, hydrogen ion beam etching characteristics of single crystal diamond chips with (100) face were investigated. The etching rate of diamond for 500 eV and 1000 eV hydrogen ions increases with the increase of the ion incidence angle, and eventually reaches a maximum at the ion incidence angle of approximately 50°, then may decrease with the increase of the ion incidence angle. The dependence of the etching rate on the ion incidence angle of hydrogen ions is fairly similar to that obtained with argon ions. Furthermore, the surface roughness of diamond chips before and after hydrogen ion beam etching was evaluated using an atomic force microscope. Consequently, the surface roughness after hydrogen ion beam etching decreases with the increase of the ion incidence angle within range of the ion incidence angle of 60°.

Facet and ripple formations on single crystal diamond tools machined by low energy oxygen ion beam

2011 ◽  
Vol 20 (7) ◽  
pp. 1056-1060 ◽  
Author(s):  
S.F. Mahmud ◽  
S.A. Pahlovy ◽  
Yoshiko Sato ◽  
Iwao Miyamoto
Keyword(s):  
Single Crystal ◽  
Ion Beam ◽  
Low Energy ◽  
Diamond Tools ◽  
Oxygen Ion ◽  
Single Crystal Diamond

scholarly journals Non-contact polishing of single crystal diamond by ion beam etching

2019 ◽  
Vol 92 ◽  
pp. 248-252 ◽  
Author(s):  
Sichen Mi ◽  
Adrien Toros ◽  
Teodoro Graziosi ◽  
Niels Quack
Keyword(s):  
Single Crystal ◽  
Ion Beam ◽  
Ion Beam Etching ◽  
Single Crystal Diamond

Reactive Ion Beam Etching Using a Broad Beam ECR Ion Source

1982 ◽  
Vol 21 (Part 2, No. 1) ◽  
pp. L4-L6 ◽  
Author(s):  
Seitaro Matsuo ◽  
Yoshio Adachi
Keyword(s):  
Ion Beam ◽  
Ion Source ◽  
Ecr Ion Source ◽  
Ion Beam Etching ◽  
Broad Beam ◽  
Reactive Ion Beam Etching

Surface morphology analysis of natural single crystal diamond chips bombarded with Ar+ ion beam

Vacuum ◽  
2010 ◽  
Vol 84 (12) ◽  
pp. 1423-1426 ◽  
Author(s):  
Takashi Nagase ◽  
Hiroyuki Kato ◽  
Shahjada A. Pahlovy ◽  
Iwao Miyamoto
Keyword(s):  
Surface Morphology ◽  
Single Crystal ◽  
Ion Beam ◽  
Morphology Analysis ◽  
Single Crystal Diamond
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