The Principle of Formation of Metal-dielectric Micro-sized Metastructures
The principle of formation of layered metal-dielectric micro-sized metastructures, which are dielectric layers with deposited metal patterns, is proposed. The principle consists in the production of individual layers by photolithographic methods, followed by their assembly and alignment on a special installation using a source of high-frequency electromagnetic radiation with an antisymmetric field. The criterion for the accuracy of the alignment of layers is the power level of the received high-frequency electromagnetic signal at the output of the receiver, which fixes the field of the radiation source, scattered by the metal alignment marks applied to each matched layer. When applying the proposed principle, it is possible to combine optically opaque metaldielectric layers of metastructures, without the use of pins. A numerical assessment of the quality of layer alignment showed that the error of layer alignment when using a centimeter wavelength range for field sensing is no more than 3–4 µm.