scholarly journals Antiphase Method of the CMOS Power Amplifier Using PMOS Driver Stage to Enhance Linearity

Electronics ◽  
2020 ◽  
Vol 9 (1) ◽  
pp. 103
Author(s):  
Jiwon Kim ◽  
Changhyun Lee ◽  
Jinho Yoo ◽  
Changkun Park

We present the possibility of a complementary metal-oxide semiconductor (CMOS) power amplifier (PA) using a driver stage composed of p-channel metal oxide semiconductor (PMOS) to enhance linearity. The PMOS driver stage is designed as a cascode structure to adapt the antiphase technique to the CMOS PA. By biasing the common-source transistor of the driver stage at the subthreshold region, we obtain a gm3 value with a positive sign to cancel out the negative gm3 of the power stage, thereby enhancing the linearity. We also investigate the effect of the bias of the cascode transistor of the driver stage on third-order intermodulation distortion and amplitude-to-phase distortion. Consequently, we show that the PMOS driver stage itself acts as a pre-distorter of the power stage. To verify the possibility of the PMOS driver stage and the proposed biasing method for the antiphase technique, we design a 2.42 GHz PA using a 180 nm RFCMOS process for wireless local area network applications. We obtain a measured maximum linear output power of 21.5 dBm with a 23.4% power-added efficiency and an error vector magnitude of 3.14%. We use an 802.11 n modulated signal with 64-quadrature amplitude modulation (QAM) (MCS7) at 65 Mb/s.

2015 ◽  
Vol 8 (2) ◽  
pp. 135-141
Author(s):  
Sara Lotfi ◽  
Olof Bengtsson ◽  
Jörgen Olsson

Laterally diffused metal oxide semiconductor (LDMOS) transistors with 10 V breakdown voltage have been implemented in a 65 nm Complementary metal oxide semiconductor (CMOS) process without extra masks or process steps. Radio frequency (RF) performance for Wireless local area network (WLAN) frequencies and in X-band at 8 GHz is investigated by load-pull measurements in class AB operation for both 3.3 and 5 V supply voltage. Results at 2.45 GHz showed 290 mW/mm output power density with 17 dB linear gain and over 45% power added efficiency (PAE) at 4 dB compression at a supply voltage of 5 V. Furthermore, results in X-band at 8 GHz show 8 dB linear gain, 320 mW/mm output power density and over 22% PAE at 4 dB compression. Third-order intermodulation measurements at 8 GHz revealed OIP3 of 18.9 and 21.9 dBm at 3.3 and 5 V, respectively. The transistors were also tested for reliability which showed no drift in quiescent current after 26 h of DC stress while high-power RF stress showed only small extrapolated drift at 10 years in output power density. This is to the authors' knowledge the first time high output power density in X-band is demonstrated for integrated LDMOS transistors manufactured in a 65 nm CMOS process without extra process steps.


2021 ◽  
Author(s):  
Qicong Liang ◽  
Jiafei Yao ◽  
Yufeng Guo ◽  
ZhiKuang Cai ◽  
MingYuan Gu ◽  
...  

2012 ◽  
Vol 51 (2) ◽  
pp. 02BC01 ◽  
Author(s):  
Hamid Kiumarsi ◽  
Yutaka Mizuochi ◽  
Hiroyuki Ito ◽  
Noboru Ishihara ◽  
Kazuya Masu

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