scholarly journals The Physicochemical and Antibacterial Properties of Chitosan-Based Materials Modified with Phenolic Acids Irradiated by UVC Light

2021 ◽  
Vol 22 (12) ◽  
pp. 6472
Author(s):  
Beata Kaczmarek-Szczepańska ◽  
Marcin Wekwejt ◽  
Olha Mazur ◽  
Lidia Zasada ◽  
Anna Pałubicka ◽  
...  
Keyword(s):  
Thin Films ◽  
Antimicrobial Activity ◽  
Ferulic Acid ◽  
Phenolic Acid ◽  
Food Packaging ◽  
Antibacterial Properties ◽  
Force Microscopy ◽  
Atomic Force ◽  
Before And After

This paper concerns the physicochemical properties of chitosan/phenolic acid thin films irradiated by ultraviolet radiation with wavelengths between 200 and 290 nm (UVC) light. We investigated the preparation and characterization of thin films based on chitosan (CTS) with tannic (TA), caffeic (CA) and ferulic acid (FA) addition as potential food-packaging materials. Such materials were then exposed to the UVC light (254 nm) for 1 and 2 h to perform the sterilization process. Different properties of thin films before and after irradiation were determined by various methods such as Fourier transform infrared spectroscopy (FTIR), scanning electron microscopy (SEM), atomic force microscopy (AFM), differential scanning calorimeter (DSC), mechanical properties and by the surface free energy determination. Moreover, the antimicrobial activity of the films and their potential to reduce the risk of contamination was assessed. The results showed that the phenolic acid improving properties of chitosan-based films, short UVC radiation may be used as sterilization method for those films, and also that the addition of ferulic acid obtains effective antimicrobial activity, which have great benefit for food packing applications.

Microscopic Characterizations of Nanostructured Silicon Thin Films for Solar Cells

2011 ◽  
Vol 1321 ◽  
Author(s):  
Antonín Fejfar ◽  
Petr Klapetek ◽  
Jakub Zlámal ◽  
Aliaksei Vetushka ◽  
Martin Ledinský ◽  
...  
Keyword(s):  
Thin Films ◽  
Solar Cells ◽  
Maxwell Equations ◽  
Amorphous Matrix ◽  
Optical Power ◽  
Conductive Atomic Force Microscopy ◽  
Force Microscopy ◽  
Silicon Thin Films ◽  
Atomic Force

ABSTRACTMicroscopic characterization of mixed phase silicon thin films by conductive atomic force microscopy (C-AFM) was used to study the structure composed of conical microcrystalline grains dispersed in amorphous matrix. C-AFM experiments were interpreted using simulations of electric field and current distributions. Density of absorbed optical power was calculated by numerically solving the Maxwell equations. The goal of this study is to combine both models in order to simulate local photoconductivity for understanding the charge photogeneration and collection in nanostructured solar cells.

scholarly journals Characterization of spherical domains at the polystyrene thin film–water interface

2016 ◽  
Vol 7 ◽  
pp. 581-590 ◽  
Author(s):  
Khurshid Ahmad ◽  
Xuezeng Zhao ◽  
Yunlu Pan ◽  
Danish Hussain
Keyword(s):  
Spherical Shape ◽  
Line Tension ◽  
Lateral Force ◽  
Water Interface ◽  
Force Microscopy ◽  
Atomic Force ◽  
Before And After ◽  
Spherical Domains ◽  
Silicon Interface

Spherical domains that readily form at the polystyrene (PS)–water interface were studied and characterized using atomic force microscopy (AFM). The study showed that these domains have similar characteristics to micro- and nanobubbles, such as a spherical shape, smaller contact angle, low line tension, and they exhibit phase contrast and the coalescence phenomenon. However, their insensitivity to lateral force, absence of long-range hydrophobic attraction, and the presence of possible contaminants and scratches on these domains suggested that these objects are most likely blisters formed by the stretched PS film. Furthermore, the analysis of the PS film before and after contact with water suggested that the film stretches and deforms after being exposed to water. The permeation of water at the PS–silicon interface, caused by osmosis or defects present on the film, can be a reasonable explanation for the nucleation of these spherical domains.

Stability and Structural Characterization of Epitaxial NdNiO3 Films Grown by Pulsed Laser Deposition

2000 ◽  
Vol 658 ◽  
Author(s):  
Trong-Duc Doan ◽  
Cobey Abramowski ◽  
Paul A. Salvador
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
X Ray Diffraction ◽  
Force Microscopy ◽  
Atomic Force ◽  
Monoclinic Distortion

ABSTRACTThin films of NdNiO3 were grown using pulsed laser deposition on single crystal substrates of [100]-oriented LaAlO3 and SrTiO3. X-ray diffraction and reflectivity, scanning electron microscopy, and atomic force microscopy were used to characterize the chemical, morphological and structural traits of the thin films. Single-phase epitaxial films are grown on LaAlO3 and SrTiO3 at 625°C in an oxygen pressure of 200 mTorr. At higher temperatures, the films partially decompose to Nd2NiO4 and NiO. The films are epitaxial with the (101) planes (orthorhombic Pnma notation) parallel to the substrate surface. Four in-plane orientational variants exist that correspond to the four 90° degenerate orientations of the film's [010] with respect to the in-plane substrate directions. Films are observed to be strained in accordance with the structural mismatch to the underlying substrate, and this leads, in the thinnest films on LaAlO3, to an apparent monoclinic distortion to the unit cell.

Mechanical characterization of polymeric thin films by atomic force microscopy based techniques

2012 ◽  
Vol 405 (5) ◽  
pp. 1463-1478 ◽  
Author(s):  
Daniele Passeri ◽  
Marco Rossi ◽  
Emanuela Tamburri ◽  
Maria Letizia Terranova
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Mechanical Characterization ◽  
Polymeric Thin Films ◽  
Force Microscopy ◽  
Atomic Force

Surface Characterization of Fe-Ag Thin Films by Atomic Force Microscopy

2004 ◽  
Vol 20-21 ◽  
pp. 611-616
Author(s):  
José M. Barandiarán ◽  
Iñaki Orue ◽  
M.L. Fdez-Gubieda ◽  
A. García Prieto
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Surface Characterization ◽  
Force Microscopy ◽  
Atomic Force

Effects of Annealing on Pulsed Laser Deposited TiO2 Thin Films

2013 ◽  
Vol 446-447 ◽  
pp. 306-311 ◽  
Author(s):  
Sudhanshu Dwivedi ◽  
Somnath Biswas
Keyword(s):  
Thin Films ◽  
Pulsed Laser ◽  
X Ray Diffraction ◽  
Force Microscopy ◽  
Si Substrates ◽  
Morphological Studies ◽  
Atomic Force ◽  
Deposited Films ◽  
Type Crystal

Mixed phase TiO2 thin films of rutile and anatase type crystal orientations were deposited on Si substrates by pulsed laser deposition (PLD) technique. When annealed at 800°C at 1 mbar oxygen pressure for 3 h, the deposited films transform into a single phase of rutile type. Structural and morphological studies of the as-deposited and annealed films were performed with X-ray diffraction (XRD), Fourier transform infra-red spectroscopy (FTIR), Raman spectroscopy, and atomic force microscopy (AFM). Photoluminescence (PL) spectroscopy was used for optical characterization of the annealed thin films.

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