scholarly journals The Interface and Fabrication Process of Diamond/Cu Composites with Nanocoated Diamond for Heat Sink Applications

Metals ◽  
2021 ◽  
Vol 11 (2) ◽  
pp. 196
Author(s):  
Yaqiang Li ◽  
Hongyu Zhou ◽  
Chunjing Wu ◽  
Zheng Yin ◽  
Chang Liu ◽  
...  

The coefficients of thermal expansion (CTE) and thermal conductivity (TC) are important for heat sink applications, as they can minimize stress between heat sink substrates and chips and prevent failure from thermal accumulation in electronics. We investigated the interface behavior and manufacturing of diamond/Cu composites and found that they have much lower TCs than copper due to their low densities. Most defects, such as cavities, form around diamond particles, substantially decreasing the high TC of diamond reinforcements. However, the measurement results for the Cu-coated diamond/Cu composites are unsatisfactory because the nanosized copper layer on the diamond surface grew and spheroidized at elevated sintering temperatures. Realizing ideal interfacial bonding between a copper matrix and diamond particles is difficult. The TC of the 40 vol.% Ti-coated diamond/Cu composite is 475.01 W m−1 K−1, much higher than that of diamond/Cu and Cu-coated diamond/Cu composites under equivalent manufacturing conditions. The minimally grown titanium layer retained its nanosized and was consistent with the sintering temperature. Depositing a nanosized titanium layer on a diamond surface will strengthen interfacial bonding through interface reactions among the copper matrix, nanosized titanium layer and diamond particles, reducing the interfacial thermal resistance and exploiting the high TC of diamond particles, even if defects from powder metallurgy remain. These results provide an important experimental and theoretical basis for manufacturing diamond/Cu composites for heat sink applications.

2019 ◽  
Vol 34 (01n03) ◽  
pp. 2040050 ◽  
Author(s):  
Shanquan Jia ◽  
Yu Su ◽  
Leandro Bolzoni ◽  
Fei Yang

Copper/diamond composites can be used as heat-sink materials for high-power electronic devices due to their potential high thermal conductivity. However, it is challenging to obtain well-bonded interface between the copper matrix and the diamond particles. In this paper, we fabricated copper/diamond composites with [Formula: see text] wt.% of chromium additive ([Formula: see text], 3 and 7.4, and the corresponding composite was referred to as 1Cr-Cu/Dia, 3Cr-Cu/Dia and 7Cr-Cu/Dia, respectively) by hot forging of powder preforms. Results showed that only Cr3C2 interfacial layer formed between the copper matrix and the diamond particles for the 1Cr-Cu/Dia and 3Cr-Cu/Dia composites with a thickness of about 100 and 500 nm, respectively. A Cr/Cr3C2 dual layer interface formed in the 7Cr-Cu/Dia composite and its thickness was [Formula: see text]m. The coverage of diamond surface by the interface layer increased with increasing the adding amount of chromium in the composites. The 3Cr-Cu/Dia composite achieved the highest relative density and bonding strength, comparing to 1Cr-Cu/Dia and 7Cr-Cu/Dia composites, attributed to the formation of an optimal interface structure.


Author(s):  
Quanfang Chen ◽  
Guang Chai ◽  
Bo Li

Carbon nanotubes (CNTs) are excellent multifunctional materials in terms of mechanical robustness, thermal, and electrical conductivities. These multifunctional properties, as well as the small size of the structures, make CNTs ideal building blocks in developing nanocomposites. However, the matrix materials and the fabrication processes are critical in achieving the expected multifunctional properties of a CNT-reinforced nanocomposite. This paper has proved that electrochemical co-deposition of a metallic nanocomposite is a good approach for achieving good interfacial bonding between CNTs and a metallic matrix. Good interfacial bonding between a single-walled carbon nanotube (SWCNT) and a copper matrix has been verified by enhanced fracture toughness (increased stickiness) and a shift in the Raman scattering spectra. For the Cu/SWCNT nanocomposite, the radial breath mode (RBM) has disappeared and the tangential or G-band has shifted and widened, which is an indication of better energy transport.


Author(s):  
Gary L. Solbrekken ◽  
Kazuaki Yazawa ◽  
Avram Bar-Cohen

It is well established that the power dissipation for electronic components is increasing. At the same time, high performance portable equipment with volume, weight, and power limitations are gaining widespread acceptance in the marketplace. The combination of the above conditions requires thermal solutions that are high performance and yet small, light, and power efficient. This paper explores the possibility of using thermoelectric (TE) refrigeration as an integrated solution for portable electronic equipment accounting for heat sink and interface material thermal resistances. The current study shows that TE refrigeration can indeed have a benefit over using just a heat sink. Performance maps illustrating where TE refrigeration offers an advantage over an air-cooled heat sink are created for a parametric range of CPU heat flows, heat sink thermal resistances, and TE material properties. During the course of the study, it was found that setting the TE operating current based on minimizing the CPU temperature (Tj), as opposed to maximizing the amount of heat pumping, significantly reduces Tj. For the baseline case studied, a reduction of 20–30°C was demonstrated over a range of CPU heat dissipation. The parametric studies also illustrate that management of the heat sink thermal resistance appears to be more critical than the CPU/TE interfacial thermal resistance. However, setting the TE current based on a minimum Tj as opposed to maximum heat pumping reduces the system sensitivity to the heat sink thermal resistance.


2021 ◽  
Vol 1016 ◽  
pp. 1682-1689
Author(s):  
Lei Lei ◽  
Leandro Bolzoni ◽  
Fei Yang

The Cu/55vol.%diamond (Ti) composites were fabricated by hot forging of the cold-pressed powder preforms, consisted of elemental copper powders and Ti-coated diamond particles, at 800 °C (800C-Cu/55Dia composite) and 1050 °C (1050C-Cu55Dia composite), respectively. Well bonded interface was achieved between the diamond and the copper matrix for the 800C-Cu/55Dia composite, and the coverage of diamond by interface was about 96%, attributed to homogeneously distributed nanospherical TiC interface formed on the diamond surface. However, obvious coarse TiC particle size and spallation of the formed interface were observed in the 1050C-Cu55Dia composite, implying that the composite had a relatively low bonding strength. The formed chemical bonding, good wettability and strong mechanical interlocking between the diamond and the copper matrix enable the 800C-Cu/55Dia composite having a high tensile strength of 145 MPa and a strain at fracture of 0.35%, which are about 260% and 170% higher than those of the 1050C-Cu55Dia composite, suggesting that the 800C-Cu/55Dia composite has the potential to have a high thermal conductivity and use as high-performance heat sink materials.


JOM ◽  
2022 ◽  
Author(s):  
Muhammad Dilawer Hayat ◽  
Harshpreet Singh ◽  
Kariappa Maletira Karumbaiah ◽  
Ying Xu ◽  
Xin-Gang Wang ◽  
...  

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