scholarly journals in Situ X-ray Photoelectron Spectroscopic and Electrochemical Studies of the Bromide Anions Dissolved in 1-Ethyl-3-Methyl Imidazolium Tetrafluoroborate

Nanomaterials ◽  
2019 ◽  
Vol 9 (2) ◽  
pp. 304 ◽  
Author(s):  
Jaanus Kruusma ◽  
Arvo Tõnisoo ◽  
Rainer Pärna ◽  
Ergo Nõmmiste ◽  
Enn Lust
Keyword(s):  
Photoelectron Spectroscopy ◽  
Mesoporous Carbon ◽  
Residual Water ◽  
Carbon Electrode ◽  
Xps Spectra ◽  
X Ray ◽  
In Situ Xps ◽  
Vacuum Interface ◽  
Photoelectron Peak

Influence of electrode potential on the electrochemical behavior of a 1-ethyl-3-methylimidazolium tetrafluoroborate (EMImBF4) solution containing 5 wt % 1-ethyl-3-methylimidazolium bromide (EMImBr) has been investigated using electrochemical and synchrotron-initiated high-resolution in situ X-ray photoelectron spectroscopy (XPS) methods. Observation of the Br 3d5/2 in situ XPS signal, collected in a 5 wt % EMImBr solution at an EMImBF4–vacuum interface, enabled the detection of the start of the electrooxidation process of the Br- anion to Br3- anion and thereafter to the Br2 at the micro-mesoporous carbon electrode, polarized continuously at the high fixed positive potentials. A new photoelectron peak, corresponding to B–O bond formation in the B 1s in situ XPS spectra at E ≤ –1.17 V, parallel to the start of the electroreduction of the residual water at the micro-mesoporous carbon electrode, was observed and is discussed. The electroreduction of the residual water caused a reduction in the absolute value of binding energy vs. potential plot slope twice to ca. dBE dE-1 = –0.5 eV V-1 at E ≤ –1.17 V for C 1s, N 1s, B 1s, F 1s, and Br 3d5/2 photoelectrons.

In-Situ XPS Study of the Aluminum Poly(p-Phenylenevinylene) Interface

1995 ◽  
Vol 385 ◽  
Author(s):  
K. Konstadinidis ◽  
F. Papadimitrakopoulos ◽  
M. Galvin ◽  
R. Opila
Keyword(s):  
Valence Band ◽  
Oxygen Content ◽  
Photoelectron Spectroscopy ◽  
Surface Oxygen ◽  
Band Bending ◽  
X Ray ◽  
In Situ Xps ◽  
Synthetic Routes ◽  
Xps Study

ABSTRACTThe chemical and electronic properties of aluminum/poly(p-phenylenevinylene) (PPV) interfaces were studied in situ using x-ray photoelectron spectroscopy (XPS). It was observed that the aluminum atoms react with the oxygen-containing groups present as impurities on the surface of PPV to form Al-O-C linkages. The Al atoms also interact with the wrsystem of the polymer as indicated by changes in the valence band. Contrary to to recent suggestions (Ettedgui et al.) the relation between surface oxygen content and band bending is not straightforward, as shown by deposition on PPV surfaces prepared by two different synthetic routes.

Thermal and Chemical Instability Between Iridium Gate Electrode and Ta205 Gate Dielectrics

1999 ◽  
Vol 567 ◽  
Author(s):  
A. Y. Mao ◽  
Y. M. Sun ◽  
J. M. White ◽  
D. L. Kwong
Keyword(s):  
Photoelectron Spectroscopy ◽  
Gate Dielectrics ◽  
Tantalum Oxide ◽  
Tantalum Pentoxide ◽  
Ex Situ ◽  
X Ray ◽  
Near Ir ◽  
Vacuum Interface ◽  
Thermal And Chemical Stability

ABSTRACTThe thermal and chemical stability of thin CVD iridium films deposited on thin CVD tantalum pentoxide (Ta2O5) films on Si(100) have been investigated by means of in-situ X-ray Photoelectron Spectroscopy (XPS) and ex-situ Angle Resolved XPS (ARXPS). It was found that upon annealing in vacuum at 800 °C for more than 1 min, tantalum oxide at the Ir-Ta2O5 interface was decomposed and formed metallic tantalum which diffused through Ir, while changes in iridium film itself were negligible. When annealed at 750 °C within 15 minutes, intermediate partially oxidized Ta was formed and coexisted with metallic and oxidized Ta. A portion of metallic Ta near Ir-vacuum interface was subsequently oxidized when the films were exposed in air.

Comparison Between the Reaction Mechanisms of Nitridation of Si(100) by a NH3 Molecular Beam and by a $\rm{N}^+_2$ Ion Beam

1998 ◽  
Vol 05 (01) ◽  
pp. 81-84 ◽  
Author(s):  
I. Kusunoki ◽  
S. Ishidzuka ◽  
Y. Igari ◽  
T. Takaoka
Keyword(s):  
Photoelectron Spectroscopy ◽  
Ion Beam ◽  
Nitride Layer ◽  
Low Energy ◽  
Nitride Film ◽  
Xps Spectra ◽  
X Ray ◽  
Energy Formula ◽  
The Difference

Nitridation of a Si(100) surface takes place with NH3 at temperatures higher than 600°C and with a low energy [Formula: see text] ion beam at room temperature, formating a thin film of nitride. The nitridation processes have been studied in situ under ultrahigh vacuum by X-ray photoelectron spectroscopy (XPS). The reaction with NH3 occurs on the surface with Si atoms supplied by out-diffusion from the substrate, producing a nitride film. On the other hand, the N atoms of the low energy [Formula: see text] ion beam (100–1000 eV) penetrate into the bulk by their kinetic energy and form the nitride layer near the surface. The difference of these mechanisms is clearly observed in the evolution of the N1s and Si2p XPS spectra during the reaction.

scholarly journals In situ XPS investigation of the X-ray-triggered decomposition of perovskites in ultrahigh vacuum condition

2021 ◽  
Vol 5 (1) ◽  
Author(s):  
Wei-Chun Lin ◽  
Wei-Chun Lo ◽  
Jun-Xian Li ◽  
Yi-Kai Wang ◽  
Jui-Fu Tang ◽  
...  
Keyword(s):  
Environmental Factors ◽  
Photoelectron Spectroscopy ◽  
Perovskite Structure ◽  
Uv Light ◽  
Ultrahigh Vacuum ◽  
Vacuum System ◽  
State Change ◽  
X Ray ◽  
In Situ Xps

AbstractX-ray photoelectron spectroscopy (XPS) has been used to investigate the composition of perovskite films upon exposure to different environmental factors, such as moisture, heat, and UV light. However, few research studies have determined that the X-ray itself could cause damage to the perovskite crystals. In this study, the X-ray-induced degradation of CH3NH3PbI3 perovskite films was investigated via XPS within an in situ ultrahigh vacuum system. It is demonstrated that fresh methylammonium lead iodine contains Pb2+ without the initial existence of Pb0. The Pb0 signal was discovered after a few hours of soft X-ray exposure, which indicates that the CH3NH3PbI3 perovskite structure undergoes a decomposition process to form metallic Pb. In addition, the nitrogen content was found to be significantly decreasing in the first hour of X-ray exposure. The discovery of the X-ray-induced chemical state change and the volatile methylamine of perovskite crystals could be further applied as an indicator for the field of X-ray sensors or detectors.

scholarly journals Optical, XPS and XRD Studies of Semiconducting Copper Sulfide Layers on a Polyamide Film

2009 ◽  
Vol 2009 ◽  
pp. 1-8 ◽  
Author(s):  
Valentina Krylova ◽  
Mindaugas Andrulevičius
Keyword(s):  
Photoelectron Spectroscopy ◽  
Copper Sulfide ◽  
Diffusion Method ◽  
X Ray Diffraction ◽  
Xps Spectra ◽  
X Ray ◽  
Xrd Studies ◽  
Polyamide Film ◽  
Indirect Band Gap ◽  
Xrd Method

Copper sulfide layers were formed on polyamide PA 6 surface using the sorption-diffusion method. Polymer samples were immersed for 4 and 5 h in 0.15 mol⋅  solutions and acidified with HCl (0.1 mol⋅) at . After washing and drying, the samples were treated with Cu(I) salt solution. The samples were studied by UV/VIS, X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) methods. All methods confirmed that on the surface of the polyamide film a layer of copper sulfide was formed. The copper sulfide layers are indirect band-gap semiconductors. The values of are 1.25 and 1.3 eV for 4 h and 5 h sulfured PA 6 respectively. Copper XPS spectra analyses showed Cu(I) bonds only in deeper layers of the formed film, while in sulfur XPS S 2p spectra dominating sulfide bonds were found after cleaning the surface with ions. It has been established by the XRD method that, beside , the layer contains as well. For PA 6 initially sulfured 4 h, grain size forchalcocite, , was  nm and fordjurleite, , it was 54.17 nm. The sheet resistance of the obtained layer varies from 6300 to 102 .

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