scholarly journals Facile Functionalization via Plasma-Enhanced Chemical Vapor Deposition for the Effective Filtration of Oily Aerosol

Polymers ◽  
2019 ◽  
Vol 11 (9) ◽  
pp. 1490 ◽  
Author(s):  
Sanghyun Roh ◽  
Sungmin Kim ◽  
Jooyoun Kim
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Filter Design ◽  
Chemical Vapor ◽  
Surface Modifications ◽  
Solid Particles ◽  
Oxygen Species ◽  
Plasma Process ◽  
Filter Performance ◽  
Filtration Performance

With the growing concern about the health impacts associated with airborne particles, there is a pressing need to design an effective filter device. The objective of this study is to investigate the effect of plasma-based surface modifications on static charges of electrospun filter media and their resulting filtration performance. Polystyrene (PS) electrospun web (ES) had inherent static charges of ~3.7 kV due to its electric field-driven process, displaying effective filtration performance. When oxygen species were created on the surface by the oxygen plasma process, static charges of electret media decreased, deteriorating the filter performance. When the web surface was fluorinated by the plasma-enhanced chemical vapor deposition (PECVD), the filtration efficiency against oily aerosol significantly increased due to the combined effect of decreased wettability and strong static charges (~−3.9 kV). Solid particles on the charged media formed dendrites as particles were attracted to other layers of particles, building up a pressure drop. The PECVD process is suggested as a facile functionalization method for effective filter design, particularly for capturing oily aerosol.

Multifunctional particle coating by plasma process and its application to pollution control

RSC Advances ◽  
2014 ◽  
Vol 4 (56) ◽  
pp. 29866-29876 ◽  
Author(s):  
Anna Nasonova ◽  
Kyo-Seon Kim
Keyword(s):  
Chemical Vapor Deposition ◽  
Pollution Control ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Plasma Process ◽  
Particle Coating

Multifunctional particle coating by Plasma-Enhanced Chemical Vapor Deposition (PECVD) and its application are presented in this review.

Instabilities and Structure Formation in Laser Processing

1995 ◽  
Vol 397 ◽  
Author(s):  
D. Bàuerle ◽  
E. Arenholz ◽  
N. Arnold ◽  
J. Heitz ◽  
P.B. Kargl
Keyword(s):  
Chemical Vapor Deposition ◽  
Laser Ablation ◽  
Structure Formation ◽  
Coherent Structures ◽  
Vapor Deposition ◽  
Laser Processing ◽  
Chemical Vapor ◽  
Surface Modifications ◽  
Different Types

ABSTRACTThis paper gives an overview on different types of instabilities and structure formation in various fields of laser processing. Among the examples discussed in detail are non-coherent structures observed in laser-induced chemical vapor deposition (LCVD), in laser-induced surface modifications, and in laser ablation of polymers.

scholarly journals Growth promotion of vertical graphene on SiO2/Si by Ar plasma process in plasma-enhanced chemical vapor deposition

RSC Advances ◽  
2018 ◽  
Vol 8 (34) ◽  
pp. 18757-18761 ◽  
Author(s):  
Yanping Sui ◽  
Zhiying Chen ◽  
Yanhui Zhang ◽  
Shike Hu ◽  
Yijian Liang ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Plasma Treatment ◽  
Vapor Deposition ◽  
Growth Promotion ◽  
Chemical Vapor ◽  
Plasma Process ◽  
Ar Plasma

This study investigates the growth promotion of vertically oriented graphene in plasma-enhanced chemical vapor deposition through Ar plasma treatment.

In situ study of electron beam-induced chemical vapor deposition of Au in an environmental TEM

1995 ◽  
Vol 53 ◽  
pp. 256-257
Author(s):  
J. Drucker ◽  
R. Sharma ◽  
J. Kouvetakis ◽  
K.H.J. Weiss
Keyword(s):  
Electron Beam ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Quantum Effect ◽  
Line Drawing ◽  
Chemical Vapor ◽  
Environmental Cell ◽  
Engineering Changes ◽  
Kinetics Of

Patterning of metals is a key element in the fabrication of integrated microelectronics. For circuit repair and engineering changes constructive lithography, writing techniques, based on electron, ion or photon beam-induced decomposition of precursor molecule and its deposition on top of a structure have gained wide acceptance Recently, scanning probe techniques have been used for line drawing and wire growth of W on a silicon substrate for quantum effect devices. The kinetics of electron beam induced W deposition from WF6 gas has been studied by adsorbing the gas on SiO2 surface and measuring the growth in a TEM for various exposure times. Our environmental cell allows us to control not only electron exposure time but also the gas pressure flow and the temperature. We have studied the growth kinetics of Au Chemical vapor deposition (CVD), in situ, at different temperatures with/without the electron beam on highly clean Si surfaces in an environmental cell fitted inside a TEM column.

The relaxation of compressive biaxial strains in SOS via microtwins

1989 ◽  
Vol 47 ◽  
pp. 608-609
Author(s):  
M. E. Twigg ◽  
E. D. Richmond ◽  
J. G. Pellegrino
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Molecular Beam Epitaxy ◽  
Compressive Stress ◽  
Vapor Deposition ◽  
Partial Dislocation ◽  
Molecular Beam ◽  
Volume Fraction ◽  
Chemical Vapor ◽  
Silicon Thin Film

For heteroepitaxial systems, such as silicon on sapphire (SOS), microtwins occur in significant numbers and are thought to contribute to strain relief in the silicon thin film. The size of this contribution can be assessed from TEM measurements, of the differential volume fraction of microtwins, dV/dν (the derivative of the microtwin volume V with respect to the film volume ν), for SOS grown by both chemical vapor deposition (CVD) and molecular beam epitaxy (MBE).In a (001) silicon thin film subjected to compressive stress along the [100] axis , this stress can be relieved by four twinning systems: a/6[211]/( lll), a/6(21l]/(l1l), a/6[21l] /( l1l), and a/6(2ll)/(1ll).3 For the a/6[211]/(1ll) system, the glide of a single a/6[2ll] twinning partial dislocation draws the two halves of the crystal, separated by the microtwin, closer together by a/3.

Coating of continuous carbon fibers with double layers by chemical vapor deposition

2001 ◽  
Vol 11 (PR3) ◽  
pp. Pr3-885-Pr3-892 ◽  
Author(s):  
N. Popovska ◽  
S. Schmidt ◽  
E. Edelmann ◽  
V. K. Wunder ◽  
H. Gerhard ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Carbon Fibers ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Double Layers
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