The photoresponsivity of monolayer molybdenum disulfide grown by chemical vapor deposition with different seeding promoters

2020 ◽  
Vol 13 (7) ◽  
pp. 071006
Author(s):  
Ai-Guo Yang ◽  
Jiajun Chen ◽  
Peng Yang ◽  
Laigui Hu ◽  
Ran Liu ◽  
...  
Materials ◽  
2018 ◽  
Vol 11 (4) ◽  
pp. 631 ◽  
Author(s):  
Song Zhang ◽  
Jiajia Liu ◽  
Karla Ruiz ◽  
Rong Tu ◽  
Meijun Yang ◽  
...  

2020 ◽  
Vol 124 (4) ◽  
pp. 2689-2697 ◽  
Author(s):  
Erik Pollmann ◽  
Juliana M. Morbec ◽  
Lukas Madauß ◽  
Lara Bröckers ◽  
Peter Kratzer ◽  
...  

Nanoscale ◽  
2017 ◽  
Vol 9 (4) ◽  
pp. 1591-1598 ◽  
Author(s):  
Kenan Elibol ◽  
Toma Susi ◽  
Maria O′Brien ◽  
Bernhard C. Bayer ◽  
Timothy J. Pennycook ◽  
...  

2020 ◽  
Vol 204 ◽  
pp. 01003
Author(s):  
Huaizhang Wang ◽  
Yangyang Wang ◽  
Pengbo Chi ◽  
Huaning Jiang ◽  
Jingfei Chen ◽  
...  

As a graphene-like material, molybdenum disulfide has similar properties to graphene, but due to its excellent properties such as adjustable band gap, molybdenum disulfide has a broader application in many aspects (such as gas sensors). With the deepening of research, molybdenum disulfide cannot fully meet the needs of researchers due to defects and other reasons. Therefore, researches on doping and compounding of molybdenum disulfide have gradually attracted attention. At present, most of the research on gas sensitivity has focused on harmful gases (such as nitrogen dioxide, ammonia and carbon monoxide, etc.). There are few studies on the erosive chemical toxic mustard gas. In this paper, vanadium-doped molybdenum disulfide were prepared based on chemical vapor deposition, and the gas-sensitive response of vanadium-doped molybdenum disulfide to mustard gas was studied.


ACS Omega ◽  
2020 ◽  
Vol 5 (34) ◽  
pp. 21853-21861
Author(s):  
Chad A. Beaudette ◽  
Jacob T. Held ◽  
K. Andre Mkhoyan ◽  
Uwe R. Kortshagen

2017 ◽  
Vol 28 (46) ◽  
pp. 465103 ◽  
Author(s):  
Jeong-Gyu Song ◽  
Gyeong Hee Ryu ◽  
Youngjun Kim ◽  
Whang Je Woo ◽  
Kyung Yong Ko ◽  
...  

2016 ◽  
Vol 108 (8) ◽  
pp. 083104 ◽  
Author(s):  
Zhengfeng Yang ◽  
Roberto Grassi ◽  
Marcus Freitag ◽  
Yi-Hsien Lee ◽  
Tony Low ◽  
...  

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