Fourier transform infrared spectroscopy studies on thermal decomposition of tetrakis-dimethyl-amido zirconium for chemical vapor deposition of ZrN

2004 ◽  
Vol 21 (6) ◽  
pp. 1256-1259 ◽  
Author(s):  
Ihl-Woo Kim ◽  
Sung-Jae Kim ◽  
Do-Heyoung Kim ◽  
Heegweon Woo ◽  
Man-Yong Park ◽  
...  
Keyword(s):  
Thermal Decomposition ◽  
Fourier Transform ◽  
Infrared Spectroscopy ◽  
Chemical Vapor Deposition ◽  
Fourier Transform Infrared Spectroscopy ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Fourier Transform Infrared ◽  
Spectroscopy Studies

Initial Stage of Cvd Copper Deposition on Teos Oxide

1995 ◽  
Vol 403 ◽  
Author(s):  
Tue Nguyen ◽  
Shusheng He ◽  
Lawrence J. Charnesky
Keyword(s):  
Fourier Transform ◽  
Infrared Spectroscopy ◽  
Chemical Vapor Deposition ◽  
Fourier Transform Infrared Spectroscopy ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Fourier Transform Infrared ◽  
Copper Deposition ◽  
Selective Deposition ◽  
Initial Stage

AbstractSelective deposition of copper on metal (such as TiN) versus dielectric (such as oxide) requires understanding of the mechanism of chemical-vapor-deposition copper deposition. This work studies the initial stage of CVD copper deposition with hexafluoroacetylacetonate Cu(I) trimethylvinylsilane (Cu-hfac-tmvs) precursor on tetraethylorthosilicate (TEOS) oxide using Fourier transform infrared spectroscopy (FTIR).

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