Pole figure measurement of the initial growth of GaN nanoneedles on GaN/Si(111) by using hydride vapor phase epitaxy

2016 ◽  
Vol 69 (5) ◽  
pp. 837-841
Author(s):  
Injun Jeon ◽  
Ha Young Lee ◽  
Ji-Yeon Noh ◽  
Hyung Soo Ahn ◽  
Sam Nyung Yi ◽  
...  
2000 ◽  
Vol 622 ◽  
Author(s):  
Shulin Gu ◽  
Rong Zhang ◽  
Ling Zhang ◽  
T. F. Kuech

ABSTRACTThe initial stage of hydride vapor phase epitaxy GaN growth on ZnO-buffered sapphire is reported. A high supersaturation in the growth ambient was used to favor a rapid initial growth on the substrate. A subsequent step with high lateral growth rate was chosen to promote coalescence of the initial islands and provide optimal material properties. The specific mole fractions of the GaCl and NH3 control these vertical and lateral growth rates. The use of a two- step growth process in the GaN growth has led to improved and controlled morphology and high quality GaN materials have then been grown on sapphire substrate with and without ZnO buffer layers.


2001 ◽  
Vol 231 (3) ◽  
pp. 342-351 ◽  
Author(s):  
Shulin Gu ◽  
Rong Zhang ◽  
Yi Shi ◽  
Youdou Zheng ◽  
Ling Zhang ◽  
...  

2002 ◽  
Vol 14 (13-14) ◽  
pp. 991-993 ◽  
Author(s):  
H.-M. Kim ◽  
D.S. Kim ◽  
Y.S. Park ◽  
D.Y. Kim ◽  
T.W. Kang ◽  
...  

Author(s):  
Wondwosen Metaferia ◽  
Anna K. Braun ◽  
John Simon ◽  
Corinne E. Packard ◽  
Aaron J. Ptak ◽  
...  

Author(s):  
Gabin Grégoire ◽  
Mohammed Zeghouane ◽  
Curtis Goosney ◽  
Nebile Isik Goktas ◽  
Philipp Staudinger ◽  
...  

2009 ◽  
Vol 517 (6) ◽  
pp. 2088-2091 ◽  
Author(s):  
X.C. Cao ◽  
D.L. Xu ◽  
H.M. Guo ◽  
C.J. Liu ◽  
Z.J. Yin ◽  
...  

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