Strains, Stresses and Elastic Properties in Polycrystalline Metallic Thin Films: In Situ Deformation Combined with X-Ray Diffraction and Simulation Experiments

X-ray diffraction is used in combination with tensile testing for measuring elastic properties of metallic thin films. Size effect, elastic anisotropy and grain morphologies are considered in all these experiments and supported by different kind of numerical simulations operating at different length scales. Such instrumental studies are time consuming even if synchrotron sources are used. New experiments are under progress for reducing acquisition data and improving precision on strain measurements. After introducing briefly the main principles and results of our techniques, first promising measurements on nanometric W/Cu multilayers using 2D CCD detectors and high monochromatic flux at the Advanced Light Source Berkeley (USA) on beam line 11.3.1 are presented. In addition, simulation experiments for analyzing elasticity in textured gold film are discussed.

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Study of Elastic Behavior of Metallic Thin Films by 2D Synchrotron XRD and in situ Tensile Testing

MRS Proceedings ◽

10.1557/proc-1027-d01-09 ◽

2007 ◽

Vol 1027 ◽

Author(s):

Geandier Guillaume ◽

Renault Pierre-Olivier ◽

Goudeau Philippe ◽

Eric Le Bourhis ◽

Girault Baptiste

Keyword(s):

Thin Films ◽

Mechanical Response ◽

Tensile Tests ◽

Elastic Behavior ◽

Metallic Thin Films ◽

X Ray Diffraction ◽

Synchrotron Source ◽

X Ray ◽

Transmission Geometry

AbstractUnderstanding the mechanical behaviour of nano-structured thin films in relation to their structure, in particular to the grain size, is of high importance for the development of technological applications. Model nanometric multilayer W/Au systems exhibiting different structures are elaborated. These films are supported by a (thin) polyimide substrate. Films mechanical response is characterized experimentally by tensile tests carried out in-situ in a X-ray diffractometer installed on a synchrotron source. X-ray diffraction in transmission geometry has been used to study the deformations of both phases as a function of applied load. This geometry has been developed in the aim of optimizing the experiment time.

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Study of texture effect on elastic properties of Au thin films by X-ray diffraction and in situ tensile testing

Acta Materialia ◽

10.1016/j.actamat.2006.05.036 ◽

2006 ◽

Vol 54 (17) ◽

pp. 4503-4513 ◽

Cited By ~ 53

Author(s):

D. Faurie ◽

P.-O. Renault ◽

E. Le Bourhis ◽

Ph. Goudeau

Keyword(s):

Thin Films ◽

Elastic Properties ◽

Tensile Testing ◽

X Ray Diffraction ◽

X Ray ◽

Texture Effect ◽

Au Thin Films ◽

In Situ Tensile Testing

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In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition

Advanced Materials Interfaces ◽

10.1002/admi.201800957 ◽

2018 ◽

Vol 5 (24) ◽

pp. 1800957 ◽

Cited By ~ 1

Author(s):

Pouyan Motamedi ◽

Ken Bosnick ◽

Ken Cadien ◽

James D. Hogan

Keyword(s):

Thin Films ◽

Phase Transformation ◽

Atomic Layer Deposition ◽

Diffraction Analysis ◽

Atomic Layer ◽

X Ray Diffraction ◽

X Ray ◽

Nickel Thin Films ◽

Layer Deposition

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Electric-field-induced lattice distortion in epitaxial BiFeO3 thin films as determined by in situ time-resolved x-ray diffraction

Applied Physics Letters ◽

10.1063/1.5000495 ◽

2017 ◽

Vol 111 (8) ◽

pp. 082907 ◽

Cited By ~ 2

Author(s):

Seiji Nakashima ◽

Osami Sakata ◽

Hiroshi Funakubo ◽

Takao Shimizu ◽

Daichi Ichinose ◽

...

Keyword(s):

Thin Films ◽

Electric Field ◽

Lattice Distortion ◽

X Ray Diffraction ◽

Time Resolved ◽

X Ray ◽

Bifeo3 Thin Films

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Thermal stability and miscibility of co-evaporated methyl ammonium lead halide (MAPbX3, X = I, Br, Cl) thin films analysed by in situ X-ray diffraction

Journal of Materials Chemistry A ◽

10.1039/c8ta02775g ◽

2018 ◽

Vol 6 (24) ◽

pp. 11496-11506 ◽

Cited By ~ 19

Author(s):

Paul Pistor ◽

Thomas Burwig ◽

Carlo Brzuska ◽

Björn Weber ◽

Wolfgang Fränzel

Keyword(s):

Thin Films ◽

Thermal Stability ◽

Thermal Treatment ◽

Phase Evolution ◽

X Ray Diffraction ◽

Crystalline Phases ◽

X Ray ◽

Subsequent Thermal Treatment ◽

Lead Halide

We present the identification of crystalline phases by in situ X-ray diffraction during growth and monitor the phase evolution during subsequent thermal treatment of CH3NH3PbX3 (X = I, Br, Cl) perovskite thin films.

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The In-Situ Observation of Organic Thin Films During Growth Process by Using Grazing Incidence X-Ray Diffraction and Fluorescence Methods

Advances in X-Ray Analysis ◽

10.1007/978-1-4615-5377-9_71 ◽

1997 ◽

pp. 653-658

Author(s):

Kouichi Hayashi ◽

Toshihisa Horiuchi ◽

Kazumi Matsushige

Keyword(s):

Thin Films ◽

Growth Process ◽

Organic Thin Films ◽

Grazing Incidence ◽

In Situ Observation ◽

X Ray Diffraction ◽

X Ray ◽

Fluorescence Methods

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In situ X-ray diffraction study of the controlled oxidation and reduction in the V–O system for the synthesis of VO2 and V2O3 thin films

Journal of Materials Chemistry C ◽

10.1039/c5tc02553b ◽

2015 ◽

Vol 3 (43) ◽

pp. 11357-11365 ◽

Cited By ~ 34

Author(s):

Geert Rampelberg ◽

Bob De Schutter ◽

Wouter Devulder ◽

Koen Martens ◽

Iuliana Radu ◽

...

Keyword(s):

Thin Films ◽

Diffraction Study ◽

Resistance Switching ◽

X Ray Diffraction ◽

X Ray

VO2 and V2O3 thin films were prepared during in situ XRD investigation by oxidation and reduction of V and V2O5. Films show up to 5 orders of magnitude resistance switching.

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