Influential Factors on Microstructure of LaB6 Films

2013 ◽  
Vol 385-386 ◽  
pp. 3-6
Author(s):  
Jing Xu
Keyword(s):  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Bias Voltage ◽  
Substrate Surface ◽  
Influential Factors ◽  
Substrate Bias ◽  
Substrate Bias Voltage ◽  
Sputtering Deposition ◽  
Morphology Of Films

LaB6 films are deposited by magnetron sputtering deposition. ZrO2 glass is used as substrate. Bias voltage and substrate temperature are adjusted. Morphology of films that deposited at different parameters is characterized by AFM. Results of AFM shows that grains diameter on surface of LaB6 films is nanoscale, and roughness of the surface is less than 20nm. LaB6 crystallites are seen to cover substrate surface entirely. Structure of films is smooth and compactness, and there is no obviously default is found. Bias-voltage influences morphologies of films more obviously than substrate. The best bias voltage is-100V. Structure of film that deposited at 450°C is more compactness than others, and roughness of the film is least.

Effect of substrate bias voltage on corrosion of TiN/Ti multilayers deposited by magnetron sputtering

2007 ◽  
Vol 253 (17) ◽  
pp. 7192-7196 ◽  
Author(s):  
M. Flores ◽  
L. Huerta ◽  
R. Escamilla ◽  
E. Andrade ◽  
S. Muhl
Keyword(s):  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Substrate Bias ◽  
Substrate Bias Voltage

scholarly journals A study of properties of ZrO2 thin films deposited by magnetron sputtering under different plasma parameters: Biomedical application

2019 ◽  
Vol 70 (7) ◽  
pp. 117-121 ◽  
Author(s):  
Hind Zegtouf ◽  
Nadia Saoula ◽  
Mourad Azibi ◽  
Larbi Bait ◽  
Noureddine Madaoui ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Biomedical Application ◽  
Steel Substrate ◽  
Substrate Bias ◽  
X Rays ◽  
Plasma Parameters ◽  
Substrate Bias Voltage ◽  
Deposited Films

Abstract ZrO2 thin films were deposited on 316L stainless steel substrate by a radio-frequency magnetron sputtering system. The substrate bias voltage, the working gas rate and the reactive gas fraction in the gas mixture were varied. These variations produce a variation in the deferent properties of the obtained films. The deposited films were characterized by X-Rays Diffraction, Atomic Force Microscopy, nano-indentation and potentiodynamic polarization. The experimental results show that the film thickness and the roughness of the films are highly influenced by the plasma parameters. XRD results show that the monoclinic phase is predominant in unbiased deposited films. The best anti-corrosion performance and hardness were obtained for ZrO2 deposited with a substrate bias voltage of −75 V, Ar rate of 6 sccm and oxygen fraction of 25%.

Structure and Property of CrAlN Coatings Prepared by Bipolar Pulsed Dual Magnetron Sputtering (BPDMS) under Different Pulse Bias Voltage

2011 ◽  
Vol 189-193 ◽  
pp. 668-671
Author(s):  
Ming Sheng Li ◽  
Yong Zhong Fan ◽  
Shu Juan Zhang ◽  
Chang Jie Feng
Keyword(s):  
Magnetron Sputtering ◽  
Bias Voltage ◽  
High Hardness ◽  
Substrate Bias ◽  
Dense Structure ◽  
Substrate Bias Voltage ◽  
Structure And Property ◽  
Excellent Adhesion ◽  
Mechanical Performances ◽  
Negative Substrate Bias

Recently, Cr-Al-N coatings have received more and more attention of researchers owing to its standing-out mechanical performances and superior chemical stability. In this present work, CrAlN ternary coatings were deposited by a bipolar pulsed dual magnetron sputtering (BPDMS) method and the effects of substrate negative bias on deposition rate, structure, hardness and adhesion of the coatings were investigated. The application of appropriate negative substrate bias voltage leads to dense structure, high hardness and excellent adhesion for CrAlN coatings.

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