Study on Optical Constants of DLC Thin Films Based on Modified Genetic Algorithm

2012 ◽  
Vol 462 ◽  
pp. 33-37
Author(s):  
Jian Chao Li ◽  
Jun Hong Su
Keyword(s):  
Genetic Algorithm ◽  
Optical Constants ◽  
Initial Value ◽  
Sputtering Deposition ◽  
Unbalanced Magnetron Sputtering ◽  
Modified Genetic Algorithm ◽  
Unbalanced Magnetron ◽  
Operator Mutation ◽  
Global Optimal ◽  
Selection Operator

This document modified the basic genetic algorithm three important operator—selection operator, mutation operator, crossover operator drawing from competition, selection, and fitness niche adjustment idea. Take the unbalanced magnetron sputtering deposition of DLC films on Si substrate as a research sample. When fitting wavelength range is 300 ~ 1500nm, select a point every 1nm, the fitting lasting time is no more than 6s. Fitting results contrast to ellipsometer’s fitting results; the error is less than 2%. Experiments show that: the adaptive modified is effective in preventing the "premature" phenomenon, searched the global optimal, reduces the requirements on the operator to set the initial value on the fitted model and is effectiveness to fit thin film optical constants.

scholarly journals Optimization of Earthwork Allocation Path as Vehicle Route Problem Based on Genetic Algorithm

2020 ◽  
Vol 165 ◽  
pp. 04057
Author(s):  
Naifu Deng ◽  
Xuyang Li ◽  
Yanmin Su
Keyword(s):  
Genetic Algorithm ◽  
Optimization Model ◽  
Construction Projects ◽  
Vehicle Route Problem ◽  
Vehicle Route ◽  
Route Problem ◽  
Modified Genetic Algorithm ◽  
Global Optimal ◽  
The Cost ◽  
Engineering Projects

In civil engineering, earthwork, prior to the construction of most engineering projects, is a lengthy and time-consuming work involving iterative processes. The cost of many AEC (Architecture, Engineering and Construction) projects is highly dependent on the efficiency of earthworks (e.g. road, embankment, railway and slope engineering). Therefore, designing proper earthwork planning is of importance. This paper simplifies the earthwork allocation problem to Vehicle Route Problem (VRP) which is commonly discussed in the field of transportation and logistics. An optimization model for the earthwork allocation path based on the modified Genetic Algorithm with a self-adaptive mechanism is developed to work out the global optimal hauling path for earthwork. The research results also instruct the initial topographic shaping of the Winter Olympic Skiing Courses Project. Furthermore, this optimization model is highly compatible with other evolutionary algorithms due to its flexibility, therefore, further improvement in this model is feasible and practical.

Structural and Optical Properties of ZrO2 Thin Films Deposited by Reactive DC Unbalanced Magnetron Sputtering

2014 ◽  
Vol 979 ◽  
pp. 374-377
Author(s):  
Nirun Witit-Anun ◽  
Surasing Chaiyakun
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Optical Constants ◽  
Phase 1 ◽  
Grazing Incidence ◽  
Visible Range ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Surface Morphologies ◽  
Deposited Films

Zirconium oxide (ZrO2) thin films were deposited on Si-wafer and glass slide substrates by reactive DC unbalanced magnetron sputtering at different deposition times. A pure metallic zirconium target (99.97%) was sputtered in a gas mixture of argon and oxygen. The crystal structure was characterized by GI-XRD (grazing-incidence X-ray diffraction) whereas surface morphologies and films thickness were evaluated by AFM (atomic force microscopy). The transmittance spectrum was measured by spectrophotometer. The optical constants of the as-deposited films were calculated by Swanepoel method. It was found that the ZrO2films deposited on silicon substrates showed a highly monoclinic phase (-1 1 1). The as-deposited films showed high transmittance in visible range. The thickness and roughness varied from 155 nm to 502 nm and 3.1 nm to 3.6 nm, respectively, with increasing of deposition times. The optical constants namely refractive index (n) and extinction coefficient (k), at 550 nm, was about 1.9 - 2.1 and 0.0003 - 0.0009, respectively. In addition, the energy band gap (Eg) of the as-deposited film was approximately 4.17 eV.

Trapping of argon in ion beam deposited thin films of CNx Hy

2003 ◽  
Vol 792 ◽  
Author(s):  
Asghar N. Kayani ◽  
David C. Ingram
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Negative Bias ◽  
Substrate Bias ◽  
Flow Rates ◽  
Sputtering Deposition ◽  
Elemental Concentrations ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Negative Substrate Bias

ABSTRACTUnbalanced magnetron sputtering deposition of CNx Hy films has been performed with various levels of negative substrate bias and with different flow rates of nitrogen and hydrogen. Argon was used as a sputtering gas and formed the majority of the gas in the plasma. The elemental concentrations of the films were measured in samples deposited on glassy carbon with a 2.2 MeV of He beam used to perform simultaneous RBS and ERS. Argon was found to be trapped in the non-hydrogenated films to a level of up to ∼ 4.6 %. The concentration of argon increased for the films deposited under higher negative bias. With the introduction of hydrogen, argon trapping was first minimized and later completely eliminated, even at higher bias conditions, suggesting that the softness of the films brought on by hydrogenation also caused the films to be unable to trap argon during growth and thus showing that argon stability is dependent on burial below a surface of particular structural properties.

Microstructure and Properties of AlSn20 Coating Deposited via Magnetron Sputtering

2015 ◽  
Vol 816 ◽  
pp. 277-282
Author(s):  
Qiao Qin Guo ◽  
Jian Ping Li
Keyword(s):  
Magnetron Sputtering ◽  
Sputtering Deposition ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Wear And Friction ◽  
Pin On Disc ◽  
Alloy Microstructure ◽  
Bearing Alloy ◽  
Deposition Techniques

In view of the present reality of sputtered plating bearings imported in our country, unbalanced magnetron sputtering deposition techniques was used to fabricate AlSn20 anti-friction coating on aluminum bearing alloy. Microstructure characterization of the coating was performed by SEM. Micro-hardness testing of Coating were measured with a Vickers indenter. Adhesion testing was carried out with a scratch tester. Wear and friction tests were performed with a pin-on-disc tribometer. The results revealed that the AlSn20 anti-friction coating (bias voltage in the range of-60V~-100V) showed finer crystal, better corrosion resistance (Ecorr=-1.25V), higher hardness (up to 80HV0.025), better adhesion with substrate (up to 35N), and lower friction coefficients down to 0.15.

The Microstructure and Mechanical Properties of Ti/TiN Multilayer Film Synthesized by Unbalanced Magnetron Sputtering Deposition on 17-4PH Stainless Steel

2007 ◽  
Vol 353-358 ◽  
pp. 1700-1703
Author(s):  
Qi Zhang ◽  
Feng Qi ◽  
Yong Xiang Leng ◽  
Nan Huang ◽  
Zhen Bing Cai
Keyword(s):  
Stainless Steel ◽  
Wear Resistance ◽  
Magnetron Sputtering ◽  
Multilayer Film ◽  
Multilayer Films ◽  
X Ray Diffraction ◽  
Sputtering Deposition ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Corrosive Resistance

Ti/TiN multilayer films were synthesized on 17-4PH stainless steel using unbalanced magnetron sputtering. The modulation periods is ranged from 100nm to 350 nm. The microstructure of the multilayer films was analyzed by X-ray diffraction. The cross-section views of the multilayer films were studied by scanning electron microscope (SEM). The microhardness and wear resistance of the films were measured by a HXD-1000 microhardness tester and ball-on-disk wear tester. The corrosion resistance of the multilayer films was evaluated by potentiodynamic polarization scans in a 3% NaCl solution. The results showed that there was TiNx intergradation layer in the films. The microhardness and the wear resistance of the multilayer films increased with the layer number. The Ti/TiN multilayer can improve the corrosive resistance of the 17-4PH stainless steel.

Global geometry optimization of (Ar)n and B(Ar)n clusters using a modified genetic algorithm

1996 ◽  
Vol 104 (7) ◽  
pp. 2684-2691 ◽  
Author(s):  
Susan K. Gregurick ◽  
Millard H. Alexander ◽  
Bernd Hartke
Keyword(s):  
Genetic Algorithm ◽  
Geometry Optimization ◽  
Global Geometry ◽  
Modified Genetic Algorithm
Sign in / Sign up

Export Citation Format

Share Document