The Microstructure and Mechanical Properties of Ti/TiN Multilayer Film Synthesized by Unbalanced Magnetron Sputtering Deposition on 17-4PH Stainless Steel

2007 ◽  
Vol 353-358 ◽  
pp. 1700-1703
Author(s):  
Qi Zhang ◽  
Feng Qi ◽  
Yong Xiang Leng ◽  
Nan Huang ◽  
Zhen Bing Cai
Keyword(s):  
Stainless Steel ◽  
Wear Resistance ◽  
Magnetron Sputtering ◽  
Multilayer Film ◽  
Multilayer Films ◽  
X Ray Diffraction ◽  
Sputtering Deposition ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Corrosive Resistance

Ti/TiN multilayer films were synthesized on 17-4PH stainless steel using unbalanced magnetron sputtering. The modulation periods is ranged from 100nm to 350 nm. The microstructure of the multilayer films was analyzed by X-ray diffraction. The cross-section views of the multilayer films were studied by scanning electron microscope (SEM). The microhardness and wear resistance of the films were measured by a HXD-1000 microhardness tester and ball-on-disk wear tester. The corrosion resistance of the multilayer films was evaluated by potentiodynamic polarization scans in a 3% NaCl solution. The results showed that there was TiNx intergradation layer in the films. The microhardness and the wear resistance of the multilayer films increased with the layer number. The Ti/TiN multilayer can improve the corrosive resistance of the 17-4PH stainless steel.

Mechanical and Tribological Properties of W(100-x)%Cx% Coatings Deposited by DC Magnetron Sputtering

2015 ◽  
Vol 642 ◽  
pp. 184-189
Author(s):  
Yan Liang Su ◽  
Yueh Feng Lin
Keyword(s):  
Mechanical Properties ◽  
Wear Resistance ◽  
Magnetron Sputtering ◽  
X Ray Diffraction ◽  
Mechanical And Tribological Properties ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Pin On Disc ◽  
Dry Conditions ◽  
Coating Microstructure

W(100-x)%Cx% coatings with different tungsten and carbon contents were deposited by unbalanced magnetron sputtering. The microstructures and mechanical properties of the W(100-x)%C x% coatings was characterized by scanning electron microscope (SEM), X-ray diffraction (XRD), nanoindentation and adhesion testing techniques. The tribological performance of the coatings was investigated using a pin-on-disc trobometer under dry conditions. Experimental results indicated that coating microstructure, mechanical properties and wear resistance varied according to the tungsten and carbon contents of the coatings. The W72%C28% coating had the highest hardness/elastic modulus (H/E) ratio. In the ball-on-disc wear tests, it was found that the W72%C28% coating exhibited the best wear resistance.

scholarly journals Structure and Properties of Nanocrystalline (TiZr)xN1−xThin Films Deposited by DC Unbalanced Magnetron Sputtering

2016 ◽  
Vol 2016 ◽  
pp. 1-12 ◽  
Author(s):  
Yu-Wei Lin ◽  
Chia-Wei Lu ◽  
Ge-Ping Yu ◽  
Jia-Hong Huang
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Magnetron Sputtering ◽  
Flow Rate ◽  
Nitrogen Flow ◽  
Structure And Properties ◽  
X Ray Diffraction ◽  
Nitrogen Flow Rate ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron

This study aims to investigate the effects of nitrogen flow rate (0–2.5 sccm) on the structure and properties of TiZrN films. Nanocrystalline TiZrN thin films were deposited on Si (001) substrates by unbalanced magnetron sputtering. The major effects of the nitrogen flow rate were on the phase, texture, N/(Ti + Zr) ratio, thickness, hardness, residual stress, and resistivity of the TiZrN films. The nitrogen content played an important role in the phase transition. With increasing nitrogen flow rate, the phase changed from mixed TiZr and TiZrN phases to a single TiZrN phase. The X-ray diffraction results indicated that (111) was the preferred orientation for all TiZrN specimens. The N/(Ti + Zr) ratio of the TiZrN films first increased with increasing nitrogen flow rate and then stabilized when the flow rate further increased. When the nitrogen flow rate increased from 0.4 to 1.0 sccm, the hardness and residual stress of the TiZrN thin film increased, whereas the electrical resistivity decreased. None of the properties of the TiZrN thin films changed with nitrogen flow rate above 1.0 sccm because the films contained a stable single phase (TiZrN). At high nitrogen flow rates (1.0–2.5 sccm), the average hardness and resistivity of the TiZrN thin films were approximately 36 GPa and 36.5 μΩ·cm, respectively.

Nano-Structured CrN/CNx Multilayer Films

2007 ◽  
Vol 334-335 ◽  
pp. 893-896 ◽  
Author(s):  
A. Vyas ◽  
Yao Gen Shen ◽  
Zhi Feng Zhou ◽  
K.Y. Li
Keyword(s):  
Mechanical Properties ◽  
Multilayer Films ◽  
Closed Field ◽  
X Ray Diffraction ◽  
Substrate Bias Voltage ◽  
Force Microscopy ◽  
Unbalanced Magnetron Sputtering ◽  
Atomic Force ◽  
Transmission Electron ◽  
Unbalanced Magnetron

CrN/CNx nano-scale multilayered films were deposited on Si (100) substrate by closed-field unbalanced magnetron sputtering. Designed experimental parameters enabled an evaluation of the effects of negative substrate bias voltage (Vb), and bi-layer thickness λ (by changing substrate rotation rate) during deposition on the structural and mechanical properties of multilayer films. These multilayers were characterized and analyzed by transmission electron microscope (TEM), X-ray diffraction (XRD), atomic force microscopy (AFM), and nanoindentation measurements. In all cases, the CNx layers were amorphous and independent of Vb, while the microstructures of the CrN layers were dependent primarily on Vb. The CrN layers showed a mixed structure phase consisting of CrN, Cr2N, and Cr at Vb = -(40-120) V. At higher Vb values (-140 V or above), the Cr2N phase was dominant along with low CrN phase content. AFM measurements revealed that the root-mean-square (rms) surface roughness of the CrN/CNx film was 2 nm at Vb= -200 V whereas the rms values were about 9.5-3.3 nm for lower Vb values of -(40-180 V). By nanoindentation measurements, a maximum hardness of about 36 GPa was observed at Vb= -140 V. The improved mechanical properties of the films are correlated to the phase formation during deposition.

scholarly journals Stainless Steel Films Deposited by dc Unbalanced Magnetron Sputtering Using SUS304 Steel Target

2000 ◽  
Vol 64 (12) ◽  
pp. 1218-1223 ◽  
Author(s):  
Shozo Inoue ◽  
Toshiaki Saeki ◽  
Keiji Koterazawa ◽  
Hitoshi Uchida ◽  
Mikio Iwasa
Keyword(s):  
Stainless Steel ◽  
Magnetron Sputtering ◽  
Unbalanced Magnetron Sputtering ◽  
Steel Target ◽  
Unbalanced Magnetron

Microstructure and Properties of AlSn20 Coating Deposited via Magnetron Sputtering

2015 ◽  
Vol 816 ◽  
pp. 277-282
Author(s):  
Qiao Qin Guo ◽  
Jian Ping Li
Keyword(s):  
Magnetron Sputtering ◽  
Sputtering Deposition ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Wear And Friction ◽  
Pin On Disc ◽  
Alloy Microstructure ◽  
Bearing Alloy ◽  
Deposition Techniques

In view of the present reality of sputtered plating bearings imported in our country, unbalanced magnetron sputtering deposition techniques was used to fabricate AlSn20 anti-friction coating on aluminum bearing alloy. Microstructure characterization of the coating was performed by SEM. Micro-hardness testing of Coating were measured with a Vickers indenter. Adhesion testing was carried out with a scratch tester. Wear and friction tests were performed with a pin-on-disc tribometer. The results revealed that the AlSn20 anti-friction coating (bias voltage in the range of-60V~-100V) showed finer crystal, better corrosion resistance (Ecorr=-1.25V), higher hardness (up to 80HV0.025), better adhesion with substrate (up to 35N), and lower friction coefficients down to 0.15.

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