Chemical-Assisted Mechanical Polishing of Diamond Film on Wafer

2006 ◽  
Vol 505-507 ◽  
pp. 1225-1230 ◽  
Author(s):  
Hong Ho Cheng ◽  
C.C. Chen
Keyword(s):  
Surface Roughness ◽  
Potassium Permanganate ◽  
Diamond Film ◽  
Removal Rate ◽  
Diamond Films ◽  
Cvd Diamond ◽  
Industrial Applications ◽  
Potassium Persulfate ◽  
Ceramic Plate ◽  
Cvd Diamond Film

Diamond has been well recognized a strategic engineering material. It possesses excellent physical and chemical properties including the highest hardness and thermal conductivity, and good resistance to chemical erosion. Although CVD diamond film has good potential outstanding properties, its industrial applications have been limited by the non-uniform thickness and rough surface. In the current study, the CVD diamond film is polished by the chemical-assisted mechanical method with different slurries. These slurries contain strong oxidation chemical and diamond powder. During the process, the diamond film was held against the rotational ceramic plate with transverse oscillation at 90 °Cor lower. The profilometer, atomic force microscope and scanning electron microscope were used to evaluate the surface integrity of the diamond films before and after polishing. Based on the experimental results, the slurry containing potassium persulfate (K2S2O8) produces the highest material removal rate while potassium permanganate (KMnO4) develops the best local surface roughness. The strategy of using potassium persulfate for coarse polishing followed by potassium permanganate for fine polishing yields the diamond films of the best global surface roughness. The average surface roughness of the diamond film produced by the proposed technique is below 10 nm after 5 hours.

Chemical Mechanical Polishing Slurries for Chemically Vapor-Deposited Diamond Films

2013 ◽  
Vol 135 (4) ◽  
Author(s):  
Zewei Yuan ◽  
Zhuji Jin ◽  
Youjun Zhang ◽  
Quan Wen
Keyword(s):  
Potassium Permanganate ◽  
Surface Finish ◽  
Diamond Film ◽  
Chemical Mechanical Polishing ◽  
Material Removal ◽  
Diamond Films ◽  
Cvd Diamond ◽  
Mechanical Polishing ◽  
Potassium Ferrate ◽  
Cvd Diamond Film

The objective of this study is to investigate slurries for chemical mechanical polishing (CMP) of chemically vapor-deposited (CVD) diamond films based on the principle of thermokinetics combined with physical and chemical properties. The study uses the mechanical work, surface energy and oxidability of a slurry with diamond carbon as the main physical-chemical indicators in selecting the slurries. The study indentifies 10 CMP slurries of different oxidants, such as potassium ferrate, potassium permanganate, chromium trioxide and potassium dichromate, for CVD diamond film polishing. Prior to a CMP process, prepolishing with a boron carbide plate is performed to prepare a CVD diamond film with acceptable surface finish and flatness. After polishing with the CMP process a CVD diamond film is examined with optical microscopy, surface profilometry, atomic force microscopy and X-ray photoelectron spectroscopy for information on surface finish and quality, material removal and mechanisms. The study demonstrates that among the ten CMP slurries, the one with potassium ferrate as an oxidant provides the highest material removal rate of 0.055 mg/hour, and the best surface finish (Ra = 0.187 nm) and surface quality (no surface scratches nor pits), which is followed by potassium permanganate. It then discusses how mechanical stress may promote the chemical oxidation of an oxidant with diamond by forming “C-O” and “C=O” on diamond surface. The study concludes that chemical mechanical polishing is effective for CVD diamond films.

Investigation of Thermo-Chemical Polishing of CVD Diamond Film

2007 ◽  
Vol 329 ◽  
pp. 195-200 ◽  
Author(s):  
Wen Chen Chou ◽  
Choung Lii Chao ◽  
Hsi Hsin Chien ◽  
Kung Jeng Ma ◽  
Hung Yi Lin
Keyword(s):  
Diamond Film ◽  
Material Removal ◽  
Removal Rate ◽  
High Surface ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Chemical Polishing ◽  
Machined Surface ◽  
Cvd Diamond Film ◽  
Very High

ZnO/Diamond structure has attracted a lot of attentions and heavy investment recently just because diamond has the capability of producing very high surface acoustic wave (around 10,000m/s). In this present study, the microwave chemical vapor deposition (CVD) method was employed to produce diamond films on silicon single crystal. Thermo-chemical polishing experiments were then conducted on the obtained diamond films. The underlying material removal mechanisms, microstructure of the machined surface and related machining conditions were also investigated. Thermo-chemical polishing was proved to be able to remove the diamond film very effectively (4.8μm deep of diamond film was removed in 30 minutes when polishing at 550oC and 5.7m/s). The material removal rate was increased with polishing speed and pressure. Higher polishing temperature would improve the chemical reaction and result in better surface finish.

Deposition and Application of CVD Diamond Film on the Interior-Hole Surface of Shaped-Wire Drawing Die

2012 ◽  
Vol 217-219 ◽  
pp. 1022-1027
Author(s):  
Liu Jin Bian ◽  
Zi Chao Lin ◽  
Fang Hong Sun ◽  
Song Shou Guo
Keyword(s):  
Surface Quality ◽  
Diamond Film ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Cvd Diamond ◽  
Wire Drawing ◽  
Drawing Die ◽  
Before And After ◽  
Cvd Diamond Film ◽  
Drawing Dies

Abstract：The shaped-wire drawing dies are used more and more popularly in the metal product industry for several advantages of locked structure. In present investigation, a layer of CVD diamond film is deposited on the interior-hole surface of shaped-wire drawing die using a hot filament chemical vapor deposition (HFCVD) method, followed by a surface polishing process, aiming at further prolonging its working lifetime of shaped-wire drawing dies and improving the surface quality of produced wires. The scanning electron microscopy (SEM), surface profiler and Raman spectroscopy are adopted to present the characterization of both as-deposited CVD diamond films before and after polishing. Furthermore, the performance of as-fabricated CVD diamond coated drawing dies is examined in the practical production process. The results show that as-deposited CVD diamond films are homogeneous and the working surface is smoother after polishing. Comparing with the conventional shaped drawing dies, the working lifetime of the diamond coated shaped-wire drawing dies can be increased by a factor of above 10, and the shaped wires with higher surface quality can be obtained.

Study on the Surface Integrity of Polished Diamond Thick Film Prepared by EACVD

2007 ◽  
Vol 359-360 ◽  
pp. 319-323
Author(s):  
Feng Xu ◽  
Dun Wen Zuo ◽  
Rong Fa Chen ◽  
Wen Zhuang Lu ◽  
Min Wang
Keyword(s):  
Surface Roughness ◽  
Thick Film ◽  
Surface Integrity ◽  
Diamond Film ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Cvd Diamond ◽  
Deformation Energy ◽  
Polished Surface ◽  
Cvd Diamond Film

Chemical vapor deposited (CVD) diamond film is a good materials for cutting tools as its a series of excellent properties. But because of its polycrystalline morphology, CVD diamond thick film has a rough surface that limits its application in engineering. In this paper, study was carried out on the mechanical lapping of diamond film. It is shown that surface roughness of the film was reduced from Ra 4.5μm to Ra 0.2μm after 50-minute polishing. The surface integrity of polished diamond thick film was investigated, which includes surface roughness, morphology and residual stress. There are a lot of micro defects such as grooves, gas cavities and micro cracks on the polished surface, which are the intrinsic defects generated in the deposition process of CVD diamond film. The tensile stress of the film reduced through polishing as the release of the deformation energy stored in the film.

Selective Growth of B-Doped Diamond on Si-Doped Diamond Film

2012 ◽  
Vol 217-219 ◽  
pp. 1013-1017
Author(s):  
Y.X. Cui ◽  
B. Shen ◽  
F.H. Sun ◽  
Z.M. Zhang
Keyword(s):  
Diamond Film ◽  
Sacrificial Layer ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Cvd Diamond ◽  
Selective Area ◽  
Si Doped ◽  
Cvd Diamond Film ◽  
Hot Filament ◽  
Area Deposition

Si doped CVD diamond films are prepared on Si substrate by means of hot filament chemical vapor deposition (HFCVD) through adding tetraethoxysilane (TEOS) into acetone as source of reactant gas during the growth process. The samples of diamond films are investigated by scanning electron micrograph (SEM), Raman spectrum, X-ray diffractometry (XRD) and surface profiler. The experimental results show that compared with pure diamond film, Si doped CVD diamond film exhibits grain refinement and smoother surface. Then selective area deposition (SAD) of B-doped diamond films are achieved on both Si doped CVD diamond film and pure CVD diamond film with silicon dioxide layer as sacrificial layer. SEM investigation demonstrates that the boundary of patterning on pure diamond film is rather fuzzy while on pure diamond film it is trim and distinct, which is mainly attributed to the relatively low surface roughness.

Study on EDM Polishing of CVD Diamond Films

2006 ◽  
Vol 315-316 ◽  
pp. 464-468 ◽  
Author(s):  
Wen Zhuang Lu ◽  
Dun Wen Zuo ◽  
Min Wang ◽  
Feng Xu ◽  
Xiang Feng Li
Keyword(s):  
Diamond Film ◽  
Discharge Current ◽  
Material Removal ◽  
Diamond Films ◽  
Film Surface ◽  
Chemical Vapor ◽  
Cvd Diamond ◽  
Machined Surface ◽  
Cvd Diamond Film ◽  
Pulse On Time

Chemical vapor deposition (CVD) diamond is known for its superior characteristics such as hardness, toughness and wear resistance. However, due to these factors, machining CVD diamond is a difficult material removal process. A new technique to polish CVD diamond film efficiently is reported in the present paper. In the CVD deposition process, boron was doped into diamond to fabricate high-quality semi-conductive film, which make it possible to machine diamond film by electro discharged machining (EDM) method. The relationship between EDM parameter and removal processing was investigated in details. The machined surface of boron doped (B-doped) diamond films was studied by Scanning Electron Microscope (SEM) and Raman Scattering Spectroscopy (Raman). The experimental results show that EDM polishing is a highspeed material removal and low cost method for CVD diamond polishing. When the discharge current and pulse-on time increase in a certain range, the cutting-off speed and roughness will increase correspondingly. The roughness of EDM polished CVD diamond film surface is Ra<0.5μm when the discharge current is at 4A and pulse-on time is at 200μs.

Tribo-Map of CVD Diamond Film Sliding against Silicon Nitride in Air

2013 ◽  
Vol 589-590 ◽  
pp. 405-410 ◽  
Author(s):  
Su Lin Chen ◽  
Bin Shen ◽  
Fang Hong Sun
Keyword(s):  
Friction Coefficient ◽  
Wear Rate ◽  
Diamond Film ◽  
Diamond Films ◽  
Ambient Air ◽  
Cvd Diamond ◽  
Sliding Velocity ◽  
Sliding Speed ◽  
Wear Rates ◽  
Cvd Diamond Film

The tribo-map of typical CVD diamond film exhibiting the interaction between the wear rate, friction coefficient and friction conditions would help optimize the working parameters of CVD diamond film coated tools and wear-resistance components. The tribological behaviors of CVD diamond films sliding against Si3N4 balls were studied by conducting a group of tests on the ball-on-plate type reciprocating friction tester under several sliding speeds and normal loads in the ambient air. The examined MCD films and NCD films were deposited on square flat WC-Co substrates. The worn surfaces on the diamond films were observed by SEM and the wear volumes of diamond films were measured by surface profilometer. The results indicated that the influences of the sliding speeds and normal loads on the friction coefficients for both MCD films and NCD films were obvious. When the load was 6 N, MCD film obtained the lowest friction coefficient of 0.11 at the sliding velocity of 0.2 m/s, while for NCD film the minimum value was 0.07 as the sliding speed was 0.13 m/s. The wear rate of the MCD film decreased as the load improved, while for the NCD film, the tendency was just the opposite. The influence of sliding speed on the wear rate of the MCD films was not distinct, while for the NCD films, the sliding velocity greatly affects their wear rate. The wear rates of most NCD films were around 0.2×10-7 mm3/Nm, while those of the MCD films fluctuated from 0.6×10-7~1.6×10-7 mm3/Nm. To elucidate the effect of operating environment on wear mechanism of diamond/ Si3N4 tribo-pair, the tribo-map was developed.

Study on Two Kinds of Grinding Wheels for Dynamic Friction Polishing of CVD Diamond Film

2008 ◽  
Vol 389-390 ◽  
pp. 217-222 ◽  
Author(s):  
Zhu Ji Jin ◽  
Ze Wei Yuan ◽  
Ren Ke Kang ◽  
B.X. Dong
Keyword(s):  
Diamond Film ◽  
Removal Rate ◽  
Cvd Diamond ◽  
Optical Microscope ◽  
Grinding Wheel ◽  
Hot Press ◽  
X Ray Diffraction ◽  
Grinding Wheels ◽  
Cvd Diamond Film ◽  
Hot Press Sintering

This paper investigates two kinds of grinding wheels prepared by the combination of mechanical alloy and hot-press sintering (MA-HPS). Scanning electro microscopy, Optical microscope, Talysurf surface profiler, X-Ray diffraction and Raman spectroscopy were used to characterize two kinds of grinding wheels and identify the removal mechanism. It was found that FeNiCr matrix-TiC (FMT) grinding wheel yielded higher removal rate than TiAl abrasiveless carbophile (TAC) grinding wheel, which conversely owned good polishing quality; diamond was removed by transformation diamond to non-diamond carbons and then removed by mechanically or diffusion to grinding wheel during polishing process with FMT grinding wheel. While TAC grinding wheel polishing CVD diamond film mainly depended on the reaction between diamond carbon and titanium.

Development of Ultra Fine Crystalline Diamond Film and Some Applications

2004 ◽  
Vol 449-452 ◽  
pp. 461-464
Author(s):  
Yoshihiko Murakami ◽  
H. Liu ◽  
H. Hanyu
Keyword(s):  
Surface Finish ◽  
Diamond Film ◽  
Copper Alloys ◽  
Cutting Tools ◽  
Diamond Films ◽  
Cvd Diamond ◽  
Fine Surface ◽  
Edm Electrodes ◽  
End Mills ◽  
Cvd Diamond Film

We would like to report on the development of our new ultra fine crystalline CVD diamond film and some applications. CVD Diamond films have good wear resistance, but the crystal size is too large. Therefore, in case of application of diamond films for cutting tools, we cannot get fine surface finish on work materials. Recently we succeed in production ultra fine crystalline CVD diamond film and various cutting tools as taps, drills and end mills. Aluminum alloys have lately been consumed more than ever in airplanes and automobiles for the purpose of decreasing the weight of structural materials.Copper alloys are used for the electrode of electric discharge machines (EDM) recently. EDM electrodes are required fine surface finish because the surface quality of mold depends on accuracy of EDM electrodes. Soft materials such as aluminum and copper alloys have high viscosity and additionally activity. So during cutting aluminum and copper alloys we have sometimes adhesion between cutting tools and work pieces. Diamond film on tools is able to improve the reactivity to aluminum and copper alloys. But up to now the diamond film has a lot of course crystal and tend to supply rough surface finish on work pieces. We developed ultra fine crystalline diamond film on end mills by plasma chemical vapor deposition (CVD) method. Now our aircraft, automotive and molding customers can get smooth surface finish of work pieces.Keeping ISO14001, we recommend oil free cutting with ultra fine crystalline diamond coated cutting tools. Here I introduce background of the development and cutting examples with new fine diamond coated end mills.

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