Properties of 3C-SiC Grown by Sublimation Epitaxy on Different Type of Substrates

2010 ◽  
Vol 645-648 ◽  
pp. 183-186 ◽  
Author(s):  
Milena Beshkova ◽  
Jean Lorenzzi ◽  
Nikoletta Jegenyes ◽  
Jens Birch ◽  
Mikael Syväjärvi ◽  
...  

3C-SiC layers have been grown by using sublimation epitaxy at a temperature of 2000°C, on different types of on-axis 6H-SiC(0001) substrates. The influence of the type of substrate on the morphology of the layers investigated by Atomic Force Microscopy (AFM) is discussed. Stacking faults are studied by reciprocal space map (RSM) which shows that double positions domains exists.

2009 ◽  
Vol 16 (01) ◽  
pp. 19-22
Author(s):  
Y. L. GENG ◽  
Z. H. SUN

Growth mechanisms and defects formation of the manganese mercury thiocyanate (MMTC) crystal have been investigated by atomic force microscopy (AFM). Both screw dislocation controlled growth and 2D nucleation growth occur on the {110} faces. Stacking faults are observed among dislocation hillocks and the formation of them probably results from the different crystallization orientations of different spirals. Hollow channels are found around the nucleation islands and the formation of them is due to the instability of the interface generated by the rapid nucleation and growth speeds.


2019 ◽  
Vol 509 ◽  
pp. 8-16 ◽  
Author(s):  
Kang Rae Cho ◽  
Prashant Kulshreshtha ◽  
Kuang Jen J. Wu ◽  
Jong Seto ◽  
S. Roger Qiu ◽  
...  

Synlett ◽  
2017 ◽  
Vol 28 (19) ◽  
pp. 2509-2516 ◽  
Author(s):  
Peter Jacobse ◽  
Marc-Etienne Moret ◽  
Robertus Klein Gebbink ◽  
Ingmar Swart

The field of on-surface synthesis has seen a tremendous development in the past decade as an exciting new methodology towards atomically well-defined nanostructures. A strong driving force in this respect is its inherent compatibility with scanning probe techniques, which allows one to ‘view’ the reactants and products at the single-molecule level. In this article, we review the ability of noncontact atomic force microscopy to study on-surface chemical reactions with atomic precision. We highlight recent advances in using noncontact atomic force microscopy to obtain mechanistic insight into reactions and focus on the recently elaborated mechanisms in the formation of different types of graphene nanoribbons.


Soft Matter ◽  
2015 ◽  
Vol 11 (7) ◽  
pp. 1281-1292 ◽  
Author(s):  
M. R. Bonilla ◽  
J. R. Stokes ◽  
M. J. Gidley ◽  
G. E. Yakubov

The graphic illustrates different types of deformation occurring during indentation of a plant cell; the cell wall compression and elastic membrane deflection. We are seeking to disentangle these contributions using a new multi-regime analysis method, the mathematical gist of which is illustrated by the formula at the bottom of the figure.


2008 ◽  
Vol 587-588 ◽  
pp. 981-985 ◽  
Author(s):  
Elisabete R. Costa ◽  
Rogerio Colaço ◽  
António Correia Diogo

An analysis of the microstructure of several modified bitumen shown by phase detection Atomic Force Microscopy (AFM) is presented here. The phase detection and topographic AFM images, displayed three different types of microstructure: the so-called catana phase domains (beelike structures) dispersed in the peri-phase are present in most of the cases; para-phase domains are also observed in the neighbourhood of both catana and peri-phases. These results are consistent with the picture of bitumen as a heterogeneous mixture, as one should expect. The proportions of all these phases display a rather strong dependence on the nature of the modified bitumen considered, on the concentration of the modifier, as well as on the amount of aging of the mix.


Author(s):  
Z. H. Lee ◽  
C. J. Lin ◽  
S. W. Lai ◽  
J. H. Chou

Abstract This paper describes gate oxide defect localization and analysis using passive voltage contrast (PVC) and conductive atomic force microscopy (C-AFM) in a real product through two case studies. In this paper, 10% wt KOH was used to etch poly-Si and expose gate oxide. In the case studies, different types of gate oxide defects will cause different leakage paths. According to the I-V curve measured by C-AFM, we can distinguish between short mode and gate oxide related leakage. For gate oxide leakage, KOH wet etching was successfully used to identify the gate oxide pinholes.


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