Properties of 3C-SiC Grown by Sublimation Epitaxy on Different Type of Substrates
2010 ◽
Vol 645-648
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pp. 183-186
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Keyword(s):
3C-SiC layers have been grown by using sublimation epitaxy at a temperature of 2000°C, on different types of on-axis 6H-SiC(0001) substrates. The influence of the type of substrate on the morphology of the layers investigated by Atomic Force Microscopy (AFM) is discussed. Stacking faults are studied by reciprocal space map (RSM) which shows that double positions domains exists.
Keyword(s):
Keyword(s):
2020 ◽
Vol 6
(2)
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pp. 1901171
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2019 ◽
Vol 509
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pp. 8-16
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Keyword(s):
2008 ◽
Vol 587-588
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pp. 981-985
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1997 ◽
Vol 222
(1-2)
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pp. 69-82
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