Nanocrystallization in magnetron sputtered Zr–Cu–Al–Ag thin film metallic glasses

CrystEngComm ◽  
2014 ◽  
Vol 16 (13) ◽  
pp. 2835-2844 ◽  
Author(s):  
S. Thanka Rajan ◽  
A. K. Nanda Kumar ◽  
B. Subramanian
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Metallic Glasses ◽  
Amorphous Matrix ◽  
Dc Magnetron Sputtering ◽  
Characterization Techniques ◽  
Thermal Stability Of ◽  
Glassy Coating

Zr-based thin film metallic glasses (TFMG) were fabricated from a polycrystalline Zr48Cu36Al8Ag8 (at.%) target by DC magnetron sputtering. A series of characterization techniques were employed to study the structure, composition and thermal stability of the glassy coating. Annealing studies show nanocrystallites of CuZr2 in an amorphous matrix.

scholarly journals Investigation of reactively sputtered TaN thin-film resistors for microwave photonic applications

2021 ◽  
pp. 93-98
Author(s):  
Evgenii Erofeev ◽  
Egor Polyntsev ◽  
Sergei Ishutkin
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Electrical Resistance ◽  
High Thermal Stability ◽  
Tantalum Nitride ◽  
Reactive Magnetron ◽  
Microwave Photonic ◽  
Thin Film Resistors ◽  
Thermal Stability Of

Electrophysical characteristics and their thermal stability of thin-film resistors based on tantalum nitride (TaN) obtained by reactive magnetron sputtering were investigated. The optimal modes of the magnetron sputtering process are determined, ensuring the Ta2N phase film composition with the value of the specific electrical resistance of 250 μm cm and high thermal stability of the parameters. On the basis of the investigations carried out, thin-film matching resistors were manufactured for use as part of an electro-optical InP-based MZ modulator

Thermal stability of ZnO thin film prepared by RF-magnetron sputtering evaluated by thermal desorption spectroscopy

2010 ◽  
Vol 256 (21) ◽  
pp. 6350-6353 ◽  
Author(s):  
Tokiyoshi Matsuda ◽  
Mamoru Furuta ◽  
Takahiro Hiramatsu ◽  
Hiroshi Furuta ◽  
Chaoyang Li ◽  
...  
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Thermal Desorption ◽  
Thermal Desorption Spectroscopy ◽  
Rf Magnetron Sputtering ◽  
Zno Thin Film ◽  
Thermal Stability Of

Effects of substrate temperatures on the thermal stability of Al-doped ZnO thin films grown by DC magnetron sputtering

2011 ◽  
Vol 23 (2) ◽  
pp. 356-360 ◽  
Author(s):  
Jinhua Huang ◽  
Ruiqin Tan ◽  
Yulong Zhang ◽  
Jia Li ◽  
Ye Yang ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Zno Thin Films ◽  
Dc Magnetron Sputtering ◽  
Doped Zno ◽  
Substrate Temperatures ◽  
Thermal Stability Of

Thermal stability of tungsten sub-nitride thin film prepared by reactive magnetron sputtering

2017 ◽  
Vol 485 ◽  
pp. 1-7 ◽  
Author(s):  
X.X. Zhang ◽  
Y.Z. Wu ◽  
B. Mu ◽  
L. Qiao ◽  
W.X. Li ◽  
...  
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Thermal Stability Of

Thermal stability of anisotropy in TbFe films prepared by dc‐magnetron sputtering

1991 ◽  
Vol 70 (10) ◽  
pp. 5526-5532 ◽  
Author(s):  
S‐C. N. Cheng ◽  
M. H. Kryder
Keyword(s):  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Thermal Stability Of

scholarly journals Effect of Tantalum Addition on Properties of Cu–Zr–Based Thin Film Metallic Glasses (TFMGs)

Coatings ◽  
2020 ◽  
Vol 10 (6) ◽  
pp. 515 ◽  
Author(s):  
Sofiane Achache ◽  
Frederic Sanchette
Keyword(s):  
Thin Film ◽  
Mechanical Properties ◽  
Thermal Stability ◽  
Differential Scanning Calorimetry ◽  
Metallic Glasses ◽  
Xrd Analysis ◽  
Dynamic Mode ◽  
Dc Magnetron Sputtering ◽  
Scanning Calorimetry ◽  
Dsc Measurements

Cu–Zr–Ta ternary thin film metallic glasses (TFMGs) were deposited through the direct current (DC) magnetron sputtering of pure metallic targets in a dynamic mode. The effect of tantalum addition on the microstructure, mechanical properties, and thermal behavior of TFMGs were investigated. Nanoindentation measurements showed that an increase in tantalum content from 0 to 47 at % favored hardness and Young’s modulus, which rose from 5.8 to 11.23 Gpa and from 90 to 136 Gpa, respectively. XRD analysis and differential scanning calorimetry (DSC) measurements highlighted an improvement of thermal stability with the tantalum addition from 377 to 582 °C when the tantalum content increased from 0 to 31 at %.

Thermal Stability of Lead Oxide Films Prepared by Reactive DC Magnetron Sputtering

2002 ◽  
Vol 194 (1) ◽  
pp. 192-205 ◽  
Author(s):  
S. Venkataraj ◽  
O. Kappertz ◽  
R. Drese ◽  
Ch. Liesch ◽  
R. Jayavel ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Lead Oxide ◽  
Oxide Films ◽  
Dc Magnetron Sputtering ◽  
Thermal Stability Of
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