Effect of surface pretreatment in the thermal atomic layer deposition of Al2O3for passivation of crystal Si solar cells

2014 ◽  
Vol 53 (8S1) ◽  
pp. 08LC04 ◽  
Author(s):  
Meng Li ◽  
Hong-Sik Shin ◽  
Kwang-Seok Jeong ◽  
Sung-Kwen Oh ◽  
Horyeong Lee ◽  
...  
Keyword(s):  
Solar Cells ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Surface Pretreatment ◽  
Si Solar Cells ◽  
Layer Deposition ◽  
Effect Of Surface

Surface Passivation for Si Solar Cells: A Combination of Advanced Surface Cleaning and Thermal Atomic Layer Deposition of Al2O3

2012 ◽  
Vol 187 ◽  
pp. 357-361 ◽  
Author(s):  
Bart Vermang ◽  
Aude Rothschild ◽  
Karine Kenis ◽  
Kurt Wostyn ◽  
Twan Bearda ◽  
...  
Keyword(s):  
Solar Cells ◽  
Atomic Layer Deposition ◽  
Surface Passivation ◽  
Atomic Layer ◽  
Surface Cleaning ◽  
Hydrophilic Surface ◽  
Hot Air ◽  
Si Solar Cells ◽  
Layer Deposition ◽  
P Type

Thermal atomic layer deposition (ALD) of Al2O3 provides an adequate level of surface passivation for both p-type and n-type Si solar cells. To obtain the most qualitative and uniform surface passivation advanced cleaning development is required. The studied pre-deposition treatments include an HF (Si-H) or oxidizing (Si-OH) last step and finish with simple hot-air drying or more sophisticated Marangoni drying. To examine the quality and uniformity of surface passivation - after cleaning and Al2O3 deposition - carrier density imaging (CDI) and quasi-steady-state photo-conductance (QSSPC) are applied. A hydrophilic surface clean that leads to improved surface passivation level is found. Si-H starting surfaces lead to equivalent passivation quality but worse passivation uniformity. The hydrophilic surface clean is preferred because it is thermodynamically stable, enables higher and more uniform ALD growth and consequently exhibits better surface passivation uniformity.

scholarly journals Формирование гетероструктур GaP/Si-фотопреобразователей с помощью комбинации методов МОС-гидридной эпитаксии и атомно-слоевого плазмохимического осаждения

2021 ◽  
Vol 47 (14) ◽  
pp. 51
Author(s):  
А.В. Уваров ◽  
А.И. Баранов ◽  
Е.А. Вячеславова ◽  
Н.А. Калюжный ◽  
Д.А. Кудряшов ◽  
...  
Keyword(s):  
Solar Cells ◽  
Atomic Layer Deposition ◽  
Vapor Phase ◽  
Atomic Layer ◽  
Organic Vapor ◽  
Photoelectric Properties ◽  
Si Solar Cells ◽  
Layer Deposition ◽  
Additional Processing ◽  
Metal Organic

The possibility of creating a lower junction of multijunction A3B5/Si solar cells based on an n-GaP/p-Si heterostructure was shown, using a combination of plasma enhanced atomic-layer deposition (PEALD) and metal-organic vapor phase epitaxy (MOVPE) at a temperature (Ts) not exceeding 650 °C. Photoelectric properties of structures grown at 650 °C, depends on the conditions of the PEALD process, in particular, the use of additional processing in Ar plasma.

scholarly journals High-rate atomic layer deposition of Al2O3 for the surface passivation of Si solar cells

2011 ◽  
Vol 8 ◽  
pp. 301-306 ◽  
Author(s):  
Florian Werner ◽  
Walter Stals ◽  
Roger Görtzen ◽  
Boris Veith ◽  
Rolf Brendel ◽  
...  
Keyword(s):  
Solar Cells ◽  
Atomic Layer Deposition ◽  
Surface Passivation ◽  
Atomic Layer ◽  
High Rate ◽  
Si Solar Cells ◽  
Layer Deposition

Defect Control for High‐Efficiency Cu 2 ZnSn(S,Se) 4 Solar Cells by Atomic Layer Deposition of Al 2 O 3 on Precursor Film

Solar RRL ◽  
2021 ◽  
pp. 2100181
Author(s):  
Yali Sun ◽  
Pengfei Qiu ◽  
Siyu Wang ◽  
Hongling Guo ◽  
Rutao Meng ◽  
...  
Keyword(s):  
Solar Cells ◽  
Atomic Layer Deposition ◽  
High Efficiency ◽  
Atomic Layer ◽  
Precursor Film ◽  
Layer Deposition ◽  
Defect Control

scholarly journals Surface Passivation of Organometal Halide Perovskite by Atomic Layer Deposition: a Mechanism Investigation Enabling Efficient Inverted Planar Solar Cells

2021 ◽  
Author(s):  
Ran Zhao ◽  
Kai Zhang ◽  
Jiahao Zhu ◽  
Shuang Xiao ◽  
Wei Xiong ◽  
...  
Keyword(s):  
Solar Cells ◽  
Atomic Layer Deposition ◽  
High Efficiency ◽  
Surface Passivation ◽  
Perovskite Solar Cells ◽  
Wide Band ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Halide Perovskite ◽  
Interface Passivation

Interface passivation is of the pivot to achieve high-efficiency organic metal halide perovskite solar cells (PSCs). Atomic layer deposition (ALD) of wide band gap oxides has recently shown great potential...

Electrical and Optical Properties of ZnO Processed by Atomic Layer Deposition in Inverted Polymer Solar Cells

2010 ◽  
Vol 114 (48) ◽  
pp. 20713-20718 ◽  
Author(s):  
Hyeunseok Cheun ◽  
Canek Fuentes-Hernandez ◽  
Yinhua Zhou ◽  
William J. Potscavage ◽  
Sung-Jin Kim ◽  
...  
Keyword(s):  
Optical Properties ◽  
Solar Cells ◽  
Atomic Layer Deposition ◽  
Polymer Solar Cells ◽  
Atomic Layer ◽  
Electrical And Optical Properties ◽  
Layer Deposition ◽  
Inverted Polymer Solar Cells
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