Nanostructure formation on silicon surfaces by using low energy helium plasma exposure

2016 ◽  
Vol 55 (12) ◽  
pp. 120301 ◽  
Author(s):  
Shuichi Takamura ◽  
Yusuke Kikuchi ◽  
Kohei Yamada ◽  
Shiro Maenaka ◽  
Kazunobu Fujita ◽  
...  
Keyword(s):  
Low Energy ◽  
Silicon Surfaces ◽  
Helium Plasma ◽  
Plasma Exposure ◽  
Nanostructure Formation

scholarly journals Secondary electron emission of tin and tin-lithium under low energy helium plasma exposure

2017 ◽  
Vol 13 ◽  
pp. 21-27 ◽  
Author(s):  
V. Kvon ◽  
E. Oyarzabal ◽  
E. Zoethout ◽  
A.B. Martin-Rojo ◽  
T.W. Morgan ◽  
...  
Keyword(s):  
Electron Emission ◽  
Secondary Electron ◽  
Secondary Electron Emission ◽  
Low Energy ◽  
Helium Plasma ◽  
Plasma Exposure

scholarly journals Micron-Bubble Formation on Polycrystal Tungsten due to Low-Energy and High-Flux Helium Plasma Exposure

2005 ◽  
Vol 46 (3) ◽  
pp. 561-564 ◽  
Author(s):  
Dai Nishijima ◽  
Mitsutaka Miyamoto ◽  
Hirotomo Iwakiri ◽  
Minyou Ye ◽  
Noriyasu Ohno ◽  
...  
Keyword(s):  
Bubble Formation ◽  
Low Energy ◽  
Helium Plasma ◽  
High Flux ◽  
Plasma Exposure

Fuzz formation on grain-refined bulk tungsten surfaces after low energy helium plasma exposure

2021 ◽  
pp. 130921
Author(s):  
Wei Qian ◽  
Ran Wei ◽  
Ming Zhang ◽  
Peng Chen ◽  
Lian Wang ◽  
...  
Keyword(s):  
Low Energy ◽  
Helium Plasma ◽  
Plasma Exposure

P-n nanostructure formation effect of low-energy N2+ ions on n-GaAs surface

2021 ◽  
pp. 151909
Author(s):  
V.M. Mikoushkin ◽  
E.A. Makarevskaya ◽  
D.E. Marchenko
Keyword(s):  
Low Energy ◽  
Gaas Surface ◽  
Nanostructure Formation

Modeling of the impurity-induced silicon nanocone growth by low energy helium plasma irradiation

2021 ◽  
Author(s):  
Quan Shi ◽  
Shin Kajita ◽  
Shuyu Dai ◽  
Shuangyuan Feng ◽  
Noriyasu Ohno
Keyword(s):  
Low Energy ◽  
Helium Plasma ◽  
Plasma Irradiation

Surface morphology and helium retention on tungsten exposed to low energy and high flux helium plasma

2003 ◽  
Vol 313-316 ◽  
pp. 92-96 ◽  
Author(s):  
K. Tokunaga ◽  
R.P. Doerner ◽  
R. Seraydarian ◽  
N. Noda ◽  
Y. Kubota ◽  
...  
Keyword(s):  
Surface Morphology ◽  
Low Energy ◽  
Helium Plasma ◽  
High Flux

Selective Engineering of Chalcogen Defects in MoS2 by Low-Energy Helium Plasma

2019 ◽  
Vol 11 (27) ◽  
pp. 24404-24411 ◽  
Author(s):  
Binjie Huang ◽  
Feng Tian ◽  
Youde Shen ◽  
Minrui Zheng ◽  
Yunshan Zhao ◽  
...  
Keyword(s):  
Low Energy ◽  
Helium Plasma

Observations of Lattice Distortions near Silicon Surfaces Implanted with Low-Energy Nitrogen Ions by Reflection X-ray Topography

2005 ◽  
Vol 44 (8) ◽  
pp. 6277-6282
Author(s):  
Koji Futagami ◽  
Taichiro Fukumori ◽  
Noboru Tsukuda ◽  
Kiyohiro Kuroki
Keyword(s):  
Low Energy ◽  
Silicon Surfaces ◽  
X Ray ◽  
Nitrogen Ions ◽  
Lattice Distortions

GROWTH OF SiC NANOSTRUCTURES ON Si (100) USING LOW ENERGY CARBON ION IMPLANTATION AND ELECTRON BEAM RAPID THERMAL ANNEALING

2004 ◽  
Vol 03 (04n05) ◽  
pp. 425-430 ◽  
Author(s):  
A. MARKWITZ ◽  
S. JOHNSON ◽  
M. RUDOLPHI ◽  
H. BAUMANN
Keyword(s):  
Atomic Force Microscopy ◽  
Electron Beam ◽  
Ion Implantation ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Low Energy ◽  
Silicon Surfaces ◽  
Force Microscopy ◽  
Atomic Force ◽  
Implantation Fluence

A combination of 10 keV 13 C low energy ion implantation and electron beam rapid thermal annealing (EB-RTA) is used to fabricate silicon carbide nanostructures on (100) silicon surfaces. These large ellipsoidal features appear after EB-RTA at 1000°C for 15 s. Prior to annealing, the silicon surfaces are virgin-like flat. Atomic force microscopy was used to study the morphology of these structures and it was found that the diameter and number of nanoboulders are linearly dependent on the implantation fluence. Further, a linear relationship between nanoboulder diameter and spacing suggests crystal coarsening is a fundamental element in the growth mechanism.

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