Analysis of Direct Tunneling for Thin SiO2 Film

1998 ◽  
Author(s):  
Naoto MATSUO ◽  
Takashi MIURA ◽  
Aki URAKAMI ◽  
Tadaki MIYOSHI
Keyword(s):  
Sio2 Film ◽  
Direct Tunneling

SiO2 film growth by ArF laser photolysis of SiH4/N2O mixtures

1991 ◽  
Vol 51 (3-4) ◽  
pp. 171-176 ◽  
Author(s):  
Masaharu Tsuji ◽  
Minoru Sakumoto ◽  
Naoki Itoh ◽  
Hiroshi Obase ◽  
Yukio Nishimura
Keyword(s):  
Film Growth ◽  
Sio2 Film ◽  
Laser Photolysis ◽  
Arf Laser

SiO2 film deposition by XeCl laser ablation of fused silica

1995 ◽  
Vol 86 (1-4) ◽  
pp. 128-133 ◽  
Author(s):  
P. Baeri ◽  
R. Reitano ◽  
N. Marino
Keyword(s):  
Laser Ablation ◽  
Sio2 Film ◽  
Fused Silica ◽  
Film Deposition ◽  
Xecl Laser

Evidence of hole direct tunneling through ultrathin gate oxide using P/sup +/ poly-SiGe gate

1999 ◽  
Vol 20 (6) ◽  
pp. 268-270 ◽  
Author(s):  
Wen-Chin Lee ◽  
Tsu-Jae King ◽  
Chenming Hu
Keyword(s):  
Gate Oxide ◽  
Direct Tunneling

Oxide wearout phenomena of ultrathin SiO2 film during high-field stress

1992 ◽  
Vol 28 (16) ◽  
pp. 1516 ◽  
Author(s):  
H. Fukuda ◽  
M. Yasuda ◽  
T. Iwabuchi
Keyword(s):  
High Field ◽  
Sio2 Film ◽  
Field Stress
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