High-bias-stability Al2O3 films formed by high-temperature annealing after atomic layer deposition

2018 ◽  
Author(s):  
K. Horikawa ◽  
A. Hiraiwa ◽  
S. Okubo ◽  
T. Kageura ◽  
H. Kawarada
Keyword(s):  
High Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
High Temperature Annealing ◽  
Bias Stability ◽  
Layer Deposition ◽  
High Bias ◽  
Al2o3 Films

Substrate dependence on the optical properties of Al2O3 films grown by atomic layer deposition

1997 ◽  
Vol 71 (25) ◽  
pp. 3604-3606 ◽  
Author(s):  
Y. Kim ◽  
S. M. Lee ◽  
C. S. Park ◽  
S. I. Lee ◽  
M. Y. Lee
Keyword(s):  
Optical Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Substrate Dependence ◽  
Al2o3 Films

scholarly journals Electron transport mechanism through ultrathin Al2O3 films grown at low temperatures using atomic–layer deposition

2019 ◽  
Vol 34 (10) ◽  
pp. 105004
Author(s):  
Pengfei Ma ◽  
Wenhao Guo ◽  
Jiamin Sun ◽  
Jiacheng Gao ◽  
Guanqun Zhang ◽  
...  
Keyword(s):  
Electron Transport ◽  
Atomic Layer Deposition ◽  
Low Temperatures ◽  
Transport Mechanism ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Al2o3 Films
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