Structural and Electrical Properties of Terbium Scandate Films Deposited by Atomic Layer Deposition and High Temperature Annealing Effects

ECS Journal of Solid State Science and Technology ◽

10.1149/2.011201jss ◽

2012 ◽

Vol 1 (1) ◽

pp. P5-P10 ◽

Author(s):

E. Cianci ◽

A. Lamperti ◽

G. Congedo ◽

S. Spiga

Keyword(s):

High Temperature ◽

Electrical Properties ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

High Temperature Annealing ◽

Layer Deposition ◽

Structural And Electrical Properties ◽

Annealing Effects

Download Full-text

Thermal annealing effects on the structural and electrical properties of HfO2/Al2O3 gate dielectric stacks grown by atomic layer deposition on Si substrates

Journal of Applied Physics ◽

10.1063/1.1590414 ◽

2003 ◽

Vol 94 (4) ◽

pp. 2563-2571 ◽

Author(s):

Moonju Cho ◽

Hong Bae Park ◽

Jaehoo Park ◽

Cheol Seong Hwang ◽

Jong-Cheol Lee ◽

...

Keyword(s):

Electrical Properties ◽

Atomic Layer Deposition ◽

Thermal Annealing ◽

Gate Dielectric ◽

Atomic Layer ◽

Si Substrates ◽

Layer Deposition ◽

Structural And Electrical Properties ◽

Annealing Effects ◽

Al2o3 Gate Dielectric

Download Full-text

High-bias-stability Al2O3 films formed by high-temperature annealing after atomic layer deposition

10.7567/ssdm.2018.ps-4-15 ◽

2018 ◽

Author(s):

K. Horikawa ◽

A. Hiraiwa ◽

S. Okubo ◽

T. Kageura ◽

H. Kawarada

Keyword(s):

High Temperature ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

High Temperature Annealing ◽

Bias Stability ◽

Layer Deposition ◽

High Bias ◽

Download Full-text

Structural and electrical properties of TixAl1−xOy thin films grown by atomic layer deposition

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3533763 ◽

2011 ◽

Vol 29 (1) ◽

pp. 01A302 ◽

Author(s):

A. P. Alekhin ◽

A. A. Chouprik ◽

S. A. Gudkova ◽

A. M. Markeev ◽

Yu. Yu. Lebedinskii ◽

...

Keyword(s):

Electrical Properties ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Layer Deposition ◽

Structural And Electrical Properties

Download Full-text

Structural and Electrical Properties of EOT HfO2 (<1 nm) Grown on InAs by Atomic Layer Deposition and Its Thermal Stability

ACS Applied Materials & Interfaces ◽

10.1021/acsami.5b10975 ◽

2016 ◽

Vol 8 (11) ◽

pp. 7489-7498 ◽

Author(s):

Yu-Seon Kang ◽

Hang-Kyu Kang ◽

Dae-Kyoung Kim ◽

Kwang-Sik Jeong ◽

Min Baik ◽

...

Keyword(s):

Thermal Stability ◽

Electrical Properties ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Layer Deposition ◽

Structural And Electrical Properties

Download Full-text

Enhanced electrical properties of SrTiO3 thin films grown by atomic layer deposition at high temperature for dynamic random access memory applications

Applied Physics Letters ◽

10.1063/1.2939102 ◽

2008 ◽

Vol 92 (22) ◽

pp. 222903 ◽

Author(s):

Sang Woon Lee ◽

Oh Seong Kwon ◽

Jeong Hwan Han ◽

Cheol Seong Hwang

Keyword(s):

High Temperature ◽

Electrical Properties ◽

Atomic Layer Deposition ◽

Random Access ◽

Random Access Memory ◽

Atomic Layer ◽

Access Memory ◽

Layer Deposition ◽

Memory Applications

Download Full-text

Correlation of annealing effects on local electronic structure and macroscopic electrical properties for HfO2 deposited by atomic layer deposition

Applied Physics Letters ◽

10.1063/1.1626019 ◽

2003 ◽

Vol 83 (19) ◽

pp. 3984-3986 ◽

Author(s):

G. D. Wilk ◽

D. A. Muller

Keyword(s):

Electronic Structure ◽

Electrical Properties ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Layer Deposition ◽

Annealing Effects ◽

Local Electronic Structure

Download Full-text

Effect of Growth Temperature on the Structural and Electrical Properties of ZrO2 Films Fabricated by Atomic Layer Deposition Using a CpZr[N(CH3)2]3/C7H8 Cocktail Precursor

Materials ◽

10.3390/ma11030386 ◽

2018 ◽

Vol 11 (3) ◽

pp. 386 ◽

Author(s):

Jong-Ki An ◽

Nak-Kwan Chung ◽

Jin-Tae Kim ◽

Sung-Ho Hahm ◽

Geunsu Lee ◽

...

Keyword(s):

Electrical Properties ◽

Atomic Layer Deposition ◽

Growth Temperature ◽

Atomic Layer ◽

Layer Deposition ◽

Structural And Electrical Properties

Download Full-text

Effects of atomic layer deposition temperatures on structural and electrical properties of ZnO films and its thin film transistors

Metals and Materials International ◽

10.1007/s12540-010-1214-1 ◽

2010 ◽

Vol 16 (6) ◽

pp. 953-958 ◽

Author(s):

Su Cheol Gong ◽

Seokhwan Bang ◽

Hyeongtag Jeon ◽

Hyung-Ho Park ◽

Young Chul Chang ◽

...

Keyword(s):

Thin Film ◽

Electrical Properties ◽

Atomic Layer Deposition ◽

Thin Film Transistors ◽

Atomic Layer ◽

Zno Films ◽

Layer Deposition ◽

Structural And Electrical Properties

Download Full-text

Structural and electrical properties of ternary Ru–AlN thin films prepared by plasma-enhanced atomic layer deposition

Materials Research Bulletin ◽

10.1016/j.materresbull.2011.12.004 ◽

2012 ◽

Vol 47 (3) ◽

pp. 790-793 ◽

Author(s):

Yu-Ri Shin ◽

Won-Sub Kwack ◽

Yun Chang Park ◽

Jin-Hyock Kim ◽

Seung-Yong Shin ◽

...

Keyword(s):

Electrical Properties ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Layer Deposition ◽

Structural And Electrical Properties

Download Full-text

Effects of High-Temperature Annealing on Properties of Al2O3/InAlN Interface Formed by Atomic Layer Deposition

10.7567/ssdm.2013.ps-6-3 ◽

2013 ◽

Author(s):

T. Nakano ◽

M. Chiba ◽

M. Akazawa

Keyword(s):

High Temperature ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

High Temperature Annealing ◽

Layer Deposition

Download Full-text