resistance random access memory
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2021 ◽  
Vol 8 ◽  
Author(s):  
Chunlei Liu ◽  
Guokun Ma ◽  
Junpeng Zeng ◽  
Qiuyang Tan ◽  
Ziqi Zhang ◽  
...  

To achieve the highest possible integration storage density in the V-point structure, the working current of the selector in the one-selection one-resistance (1S1R) structure should match with the resistance random access memory (RRAM). In this study, a selector device is designed with a Ti/NbOx/Ti/Pt structure through the magnetron sputtering method and achieves excellent performance of threshold switching under ultra-large compliance current (CC) up to 100 mA. Furthermore, both the switching voltages and the OFF-state resistance of the device demonstrate excellent stability even when CC is increased to a milliampere level, attributed from the existence of metallic NbO in the switching layer. This study provides evidence that a Ti/NbOx/Ti/Pt device has a great potential to drive RRAM in the V-point structure.


2020 ◽  
Vol 34 (28) ◽  
pp. 2050267
Author(s):  
Tian Kang ◽  
Xiaoyu Chen ◽  
Jia Zhu ◽  
Yun Huang ◽  
Zhuojie Chen ◽  
...  

Due to the outstanding performance of resistance random access memory (RRAM) in the memory field, the study of resistive switching (RS) phenomena has become extremely noticeable in the recent years. The mechanism of metal conductive filamentary RRAM is already clear, but the conditions of the RS are still unclear. Therefore, this paper aims to explore the conditions for the occurrence of resistive, using a new RS structure called Electrolyte-Oxide-Semiconductor (EOS). This structure is based on the formation of metal conductive filament and exhibits the unipolar switching characteristics. Due to the formation or rupture of the conductive filaments, this device exhibits different resistance states. A series model of electrolyte and conductive filaments is used to explain the IV curve of this device. Compared with the device using a metal active electrode, the active electrode of this device is originally ionized. Therefore, it would be a better tool to explore the mechanism of ion migration and the formation of conductive filaments. Materials screening of metal in RRAM would also be more efficient.


2020 ◽  
Vol 110 ◽  
pp. 104951
Author(s):  
Dong Su Jeon ◽  
Ju Hyun Park ◽  
Dae Yun Kang ◽  
Tukaram D. Dongale ◽  
Tae Geun Kim

2020 ◽  
Vol 31 (25) ◽  
pp. 255204 ◽  
Author(s):  
Shuting Liu ◽  
Shurong Dong ◽  
Xingang Wang ◽  
Lin Shi ◽  
Hongsheng Xu ◽  
...  

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