shallow defect
Recently Published Documents


TOTAL DOCUMENTS

38
(FIVE YEARS 7)

H-INDEX

8
(FIVE YEARS 2)

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Marcus Einert ◽  
Pascal Hartmann ◽  
Bernd Smarsly ◽  
Torsten Brezesinski

AbstractIn this study, the preparation of anatase TiO2 nanocrystals via a facile non-aqueous sol–gel route and their characterization are reported. The 3–4 nm particles are readily dispersable in aqueous media and show excellent photoreactivity in terms of rhodamine B degradation. The catalytic performance can be further increased considerably by doping with iron and UV-light irradiation as a pre-treatment. The effect of surface ligands (blocked adsorption sites, surface defects etc.) on the photoreactivity was thoroughly probed using thermogravimetric analysis combined with mass spectrometry. Photoelectrochemical characterization of thin-film electrodes made from the same TiO2 nanocrystals showed the opposite trend to the catalytic experiments, that is, a strong decrease in photocurrent and quantum efficiency upon doping due to introduction of shallow defect states.


2021 ◽  
Author(s):  
Alejandro R. Goñi ◽  
Adrián Francisco-López ◽  
Bethan Charles ◽  
Ma. Isabel Alonso ◽  
Miquel Garriga ◽  
...  

Solar RRL ◽  
2020 ◽  
Vol 4 (6) ◽  
pp. 2000042
Author(s):  
Liang Xu ◽  
Yiming Li ◽  
Jiangjian Shi ◽  
Neil Robertson ◽  
Wenjun Wu ◽  
...  

Coatings ◽  
2019 ◽  
Vol 9 (1) ◽  
pp. 44 ◽  
Author(s):  
Sanghyun Cho ◽  
Seohan Kim ◽  
Doyeong Kim ◽  
Moonsuk Yi ◽  
Junseok Byun ◽  
...  

Amorphous In−Ga−Zn−O (a-IGZO) has been studied as a channel layer in thin-film transistors (TFTs). To improve the bias-induced instability of a-IGZO TFTs, we introduced yttrium with high bond enthalpy by magnetron co-sputtering system. The Y-doped a-IGZO (a-IGZO:Y) films show relatively lower carrier concentration and higher Hall mobility, which is due to the suppression of oxygen vacancies caused by Y doping. The a-IGZO:Y showed a relatively higher transmittance in the visible light region compared to non-doped IGZO, which could be due to the decrease of shallow defect levels caused by oxygen vacancy in the band gap. The a-IGZO without Y doping showed dramatic changes in electrical properties as times progressed (over 240 h); however, the a-IGZO:Y showed no significant changes. The a-IGZO:Y TFTs demonstrated a more stable driving mode as exhibited in the positive gate bias stress test even though the values of VTH and SS were slightly degraded.


2019 ◽  
Vol 55 (82) ◽  
pp. 12396-12399 ◽  
Author(s):  
Xiaoyang Feng ◽  
Lulu Hou ◽  
Zhenxiong Huang ◽  
Rui Li ◽  
Jinwen Shi ◽  
...  

A self-doped CZTS photocathode showed improved PEC activity due to the conduction band shift and the formation of a shallow defect level.


2018 ◽  
Author(s):  
Yu-Xiu Chen ◽  
Pei-Ning Hsu ◽  
Yu-Min Chung ◽  
Hsin-Cheng Hsu ◽  
Huai-San Ku ◽  
...  

Abstract A recently developed technique known as Electron Beam Induced Resistance Change (EBIRCH) equipped with a scanning electron microscope (SEM) utilizes a constant electron beam (e-beam) voltage across or current through the defect of interest and amplifies its resistance variation. In this study, EBIRCH is applied for a 3D NAND structure device fault isolation but suffered from nearby dielectric film deformation. The characterization of such dielectric deformation and the possible mechanisms of e-beam induced damage are discussed. As well, a threshold condition to avoid from triggering the occurrence of dielectric damage is presented for shallow defect analysis in EBIRCH application.


Sign in / Sign up

Export Citation Format

Share Document