Study the Passivation Characteristics of Microwave Annealing Applied to APALD Deposited Al2O3 Thin Film

In this study, a self-developed atmospheric pressure atomic layer deposition (APALD) system is used to deposit Al2O3 passivation film, along with the use of precursor combinations of Al(CH3)3/H2O to improve its passivation characteristics through a short-time microwave post-annealing process. Comparing the unannealed and microwave-annealed samples whose temperature is controlled at 200–500 °C, APALD non-vacuum deposited film can be realized with a higher film deposition rate, which is beneficial for increasing the production throughput while at the same time reducing the operating cost of vacuum equipment at hand. Since the microwave has a greater penetration depth during the process, the resultant thermal energy provided can be spread out evenly to the entire wafer, thereby achieving the effect of rapid annealing. The film thickness is subsequently analyzed by TEM, whereas the chemical composition is verified by EDS and XPS. The negative fixed charge and interface trap density are analyzed by the C-V measurement method. Finally, the three major indicators of τeff, SRV, and IVoc are analyzed by QSSPC to duly verify the excellent passivation performance.

Simulation of CVD Diamond Film Growth by Method of Revised KMC

The growth of CVD diamond film was simulated by using revised KMC method. The simulation was conducted at CH3 radical concentration (0.01%-0.03%) and atomic hydrogen concentration (0.01%-0.5%). The results showed that: The CVD diamond film growth under revised KMC method is superior, which is in good agreement with the experimental results. The concentration of CH3 ([CH3]) and the concentration of atomic H ([H]) can produce important effects on the film deposition rate, surface roughness and the concentration of atom H embedded in the film.

Effect of Sodium Hypophosphite Content to the Deposition Rate, Structure and Magnetic Properties of Electroless Deposited Ni-P Alloy

The deposition kinetics, structure and magnetic properties of electroless deposited films Ni-P were investigated depending on the amount of sodium hypophosphite in the electroless bath. It was found that the film deposition rate is linear and unambiguously varies with the hypophosphite content from 2 to 13 g/l and from 23 to 25 g/l. The deposition rate varies widely in the hypophosphite concentration range from 13 to 23 g/l. The films are composed of amorphous Ni-P phase and fcc Ni-P solid solution with phosphorus content from 1 to 4 at.% P according to X-ray diffraction. The partial amount of amorphous phase is increased with concentration of sodium hypophosphite. The ferromagnetic resonance field is independent on the concentration of sodium hypophosphite, which assumes to be result from the laminated allocation of the amorphous and fcc phases in the film.

The Effect of Gas Flow Rate on the Thin Film Deposition Rate on Carbon Steel Using Thermal CVD

Solid thin films have been deposited on carbon steel substrates in a chemical vapor deposition (CVD) reactor where natural gas, mostly methane (CH4), was used as a precursor gas. The effect of gas flow rate on the thin film deposition rate has been investigated experimentally. The effect of gap between activation heater and substrate on the deposition rate has also been observed. To do so, a hot filament thermal chemical vapor deposition unit is used. The flow rate of natural gas varies from 0.5 to 2 l/min at normal temperature and pressure (NTP) and the gap between activation heater and substrate varies from 4 to 6.5 mm. Results show that the deposition rate on carbon steel increases with the increase of gas flow rate. It is also seen that deposition rate increases with the decrease of gap between activation heater and substrate within the observed range. These results are analyzed by dimensional analysis to correlate the deposition rate with gas flow rate, surface roughness and film thickness. In addition, friction coefficient and wear rate of carbon steel sliding against SS 304 under different normal loads are also investigated before and after deposition. The obtained results reveal that in general, the values of friction coefficient and wear rate are lower after deposition than that of before deposition.