1.5 μm Range Self-Organized In0.65Ga0.35As/In0.52Al0.48As Quantum Wire Structures Grown on (775)B-Oriented InP Substrates by Molecular Beam Epitaxy

ABSTRACTHigh quality quantum wire (QWR) structures with an emitting wavelength in the 1.5-μm range were self-organized in an In0.65Ga0.35As/In0.52Al0.48As quantum well layer grown on a (775)B-oriented InP substrate by molecular beam epitaxy. Photoluminescence (PL) from the (775)B In0.65Ga0.35As/In0.52Al0.48As QWRs with a nominal well width of 4.8 nm was observed at 1.43 μm at 12 K, which corresponds to a PL wavelength of about 1.5 μm at room temperature. The PL peak was considerably polarized along the wire direction with a polarization degree of P [= (I∥ - I⊥) / (I∥ + I] ⊥)] = 0.14, indicating its good one-dimensionality. The FWHM of the PL peak was as small as 17 meV, which is the best value for InGaAs QWRs on InP substrates.

Characterization of Modulation Doped Pseudomorphic AlGaAs/InGaAs/GaAs Hemt Structures by Electron Beam Electroreflectance and Photoluminescence

We have investigated the optical transitions present in MBE-grown modulation doped pseudomorphic AlxGa1-xAs/InyGa1-yAs/ GaAs HEMT structures of 120Å InGaAs thickness, y values 0 to 0.28, and x values 0.20 to 0.30. From both 300K electron beam electroreflectance (EBER) and 4K photoluminescence (PL) measurements we observe transitions from the InGaAs strained quantum well layer. The intensity and lineshape of the InGaAs transition in both optical spectra are affected by processing temperatures, and provides an indication of the quality of the HEMT.In addition to strong, sharp features arising from the GaAs substrate and the superlattice buffer, the EBER data shows important characteristics of the AlGaAs layer which are unavailable from the PL. The latter include the presence of Franz-Keldysh oscillations, from which the crystal quality, composition, and electric field strength within the AlGaAs can be assessed. Specifically, when the growth temperatures are excessive, the disappearance of the Franz-Keldysh oscillations appears to be associated with outdiffusion of In from the strained layer, and consequent deterioration of active device performance.