negative electric field
Recently Published Documents


TOTAL DOCUMENTS

13
(FIVE YEARS 0)

H-INDEX

6
(FIVE YEARS 0)

2015 ◽  
Vol 15 (11) ◽  
pp. 1421-1427 ◽  
Author(s):  
L.Bruno Chandrasekar ◽  
K. Gnanasekar ◽  
M. Karunakaran ◽  
R. Chandramohan

2014 ◽  
Vol 16 (11) ◽  
pp. 5407-5411 ◽  
Author(s):  
Chandan De ◽  
Tai Hoon Kim ◽  
Kee Hoon Kim ◽  
A. Sundaresan

Time dependence of current in response to the first and second negative electric field pulses indicating the absence of ferroelectricity in NaNdMnWO6.


2013 ◽  
Vol 27 (12) ◽  
pp. 1350045
Author(s):  
SHINICHI ISHIGURI

A novel temperature-independent superconducting device that employs a doped semiconductor is presented in this study. The underlying theory of this superconductivity is confirmed by experimental results. Specifically, superconductivity generates a negative electric field with characteristics of both electrostatic and current-induced fields. This type of electric field creates a new paired interaction between two electrons and implies the existence of a new force. The negative electric field also exhibits the Meissner effect. Moreover, magnetic flux quanta are produced in the semiconductor. The Aharonov–Bohm effect is exhibited to create a superconducting current along the electric circuit of the superconducting system. Therefore, a load introduced to the circuit will also become superconductive. This finding has strong potential for practical applications. To solve the problem of critical current, a static magnetic field is applied. This field combines with the new electric field to yield cyclotron motion, which increases superconducting current.


2009 ◽  
Vol 470 (4-6) ◽  
pp. 279-284 ◽  
Author(s):  
S. Raj Mohan ◽  
M.P. Joshi ◽  
Manoranjan P. Singh

2008 ◽  
Vol 600-603 ◽  
pp. 795-798 ◽  
Author(s):  
Satoshi Tanimoto ◽  
Tatsuhiro Suzuki ◽  
Shigeharu Yamagami ◽  
Hideaki Tanaka ◽  
Tetsuya Hayashi ◽  
...  

It was experimentally shown that an ONO gate dielectric carefully formed on 4H-SiC has extremely high reliability even under a negative electric field at least up to a junction temperature of 300°C, making it promising for power MOS and CMOS applications. Medium charge to failure of –30 C/cm2 was achieved for fully processed polycrystalline Si gate MONOS capacitors with an equivalent SiO2 thickness of teq = 44 nm and a 200-μm diameter. The medium time to failure of these capacitors projected for –3 MV/cm exceeds 86 and 6.3 thousand years at room temperature and 300°C, respectively. A parasitic memory action did not appear even when Eox of -6.6 MV/cm was applied for 5000 seconds.


Sign in / Sign up

Export Citation Format

Share Document