Annealing effects on optical and structural properties of chromium oxide thin film deposited by PLD technique

Optical properties of chromium oxide (Cr2O3) thin films which were prepared by pulse laser deposition method, onto glass substrates. Different laser energy (500-900) mJ were used to obtain Cr2O3 thin films with thickness ranging from 177.3 to 372.4 nm were measured using Tolansky method. Then films were annealed at temperature equal to 300 °C. Absorption spectra were used to determine the absorption coefficient of the films, and the effects of the annealing temperature on the absorption coefficient were investigated. The absorption edge shifted to red range of wavelength, and the optical constants of Cr2O3 films increases as the annealing temperature increased to 300 °C. X-ray diffraction (XRD) study reveals that Cr2O3 thin films are amorphous; while the crystal structure of annealed Cr2O3 films is rhombohedral after annealing at 300 °C for two hour. AFM studies of Cr2O3 thin films exhibit a smooth and well dispersed on the surface.

Crystal Structures and Surface Morphologies of LaGaO3-Based Epitaxial Thin Films Grown by a Pulse Laser Deposition Method

High-quality La0.84Sr0.16Ga0.26Mg0.74O3-δ (LSGM) epitaxial thin films were successfully grown on (100)-SrTiO3 (STO) substrates at a temperature of 800 °C by a pulsed laser deposition (PLD) method with KrF excimer laser pulses at an ozone pressure of 1.3 × 103 Pa. X-ray diffraction rocking curve measurements showed that the LSGM films had a full-width at half-maximum (FWHM) value of 0.11 °for out-of-plane 002 reflection, which was smaller than that reported for LaGaO3 films grown by atomic layer deposition methods (0.18 o). The reciprocal spaces mapping of 103 refraction showed that the LSGM films had a slightly larger lattice parameter a (out-of-plane) of 0.393 nm than a// (in-plane) of 0.391 nm.

Preparation and Electrical Properties of (100) Preferred (Ba,Sr)TiO3 Bilayer Thin Films Derived from Pulse Laser Deposition Method

Bilayer Ba0.6Sr0.4TiO3 - Ba0.4Sr0.6TiO3 and Ba0.4Sr0.6TiO3 - Ba0.6Sr0.4TiO3 thin films were deposited on the LaNiO3-buffered Pt/Ti/SiO2/Si substrates using pulse laser deposition method. A (100)preferred orientation was obtained. The structure was characterized using x-ray diffraction (XRD) and Raman spectroscopy. The leakage current, and dielectric permittivity versus temperature were characterized. Results indicated that the (100) preferred bilayer structure had less leakage current and smaller loss tangent, which was in favor of enhancing the quality of thin film used as microwave dielectrics.

Stress Analysis of Strained Superlattices.

The latest successful development of smart technologies, in particular, molecular-beam epitaxy technique and pulse-laser deposition method, made it possible to manufacture optoelectronic active elements based on semiconductor materials with sufficient mismatch of the lattice parameters. This problem is of special interest for preparing photosensitive devices with strained superlattices. The paper focuses on the analysis of charge carriers behavior in mechanically strained superlattices based on semiconductor materials from A2B6 and A4B6 (ZnSe, ZnTe and PbS) playing an important role in the optoelectronics design. Computational modeling is settled on the solution of one-dimensional Schroedinger equation.