Emerging Semiconductor Technology
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54

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Published By ASTM International

9780803104594

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Qualification of GaAs and AlGaAs by Optical and Surface Analysis Techniques

Emerging Semiconductor Technology ◽

10.1520/stp25797s ◽

2008 ◽

pp. 628-628-22

Author(s):

JF Black ◽

JM Berak ◽

GG Peterson

Keyword(s):

Surface Analysis ◽

Analysis Techniques ◽

Surface Analysis Techniques

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Applications of x-ray Fluorescence Analysis to the Thin Layer on Silicon Wafers

Emerging Semiconductor Technology ◽

10.1520/stp25796s ◽

2008 ◽

pp. 615-615-13

Author(s):

T Shiraiwa ◽

T Ochiai ◽

M Sano ◽

Y Tada ◽

T Arai

Keyword(s):

Fluorescence Analysis ◽

Silicon Wafers ◽

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Analysis of Boron Profiles As Determined by Secondary Ion Mass Spectrometry, Spreading Resistance, and Process Modeling

Emerging Semiconductor Technology ◽

10.1520/stp25790s ◽

2008 ◽

pp. 573-573-13

Author(s):

GW Banke ◽

K Varahramyan ◽

GJ Slusser

Keyword(s):

Mass Spectrometry ◽

Process Modeling ◽

Secondary Ion Mass Spectrometry ◽

Spreading Resistance ◽

Ion Mass Spectrometry ◽

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Spreading Resistance Measurements — An Overview

Emerging Semiconductor Technology ◽

10.1520/stp25783s ◽

2008 ◽

pp. 453-453-27 ◽

Author(s):

JR Ehrstein

Keyword(s):

Spreading Resistance

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Computerized Yield Modeling

Emerging Semiconductor Technology ◽

10.1520/stp25779s ◽

2008 ◽

pp. 404-404-10

Author(s):

CH Beck

Keyword(s):

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Quality Control and Optimization During Plasma Deposition of a-Si:H

Emerging Semiconductor Technology ◽

10.1520/stp25754s ◽

2008 ◽

pp. 241-241-9

Author(s):

M Kunst ◽

A Werner ◽

G Beck ◽

U Kuppers ◽

H Tributsch

Keyword(s):

Quality Control ◽

Plasma Deposition

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The Bonding Structure and Compositional Analysis of Plasma Enhanced and Low Pressure Chemical Vapor Deposited Silicon Dielectric Films

Emerging Semiconductor Technology ◽

10.1520/stp25750s ◽

2008 ◽

pp. 173-173-17

Author(s):

SV Nguyen ◽

JR Abernathey ◽

SA Fridmann ◽

ML Gibson

Keyword(s):

Compositional Analysis ◽

Chemical Vapor ◽

Low Pressure ◽

Dielectric Films ◽

Bonding Structure ◽

Chemical Vapor Deposited ◽

Pressure Chemical

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Deposition and Properties of Ultra-Thin High Dielectric Constant Insulators

Emerging Semiconductor Technology ◽

10.1520/stp25747s ◽

2008 ◽

pp. 137-137-13

Author(s):

S Roberts ◽

JG Ryan ◽

DW Martin

Keyword(s):

Dielectric Constant ◽

High Dielectric Constant ◽

High Dielectric

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Silicon Epitaxial Growth on N+ Substrate for CMOS Products

Emerging Semiconductor Technology ◽

10.1520/stp25741s ◽

2008 ◽

pp. 65-65-14

Author(s):

RB Swaroop

Keyword(s):

Epitaxial Growth

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Thin Silicon Epitaxial Films Deposited at Low Temperatures

Emerging Semiconductor Technology ◽

10.1520/stp25738s ◽

2008 ◽

pp. 24-24-9 ◽

Author(s):

H-R Chang ◽

JS Rosczak

Keyword(s):

Low Temperatures ◽

Epitaxial Films ◽

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