Nanomeshes at Liquid Interfaces: From Free-Standing Hole Arrays toward Metal-Insulator-Metal Architectures

2018 ◽  
Vol 5 (10) ◽  
pp. 1800154 ◽  
Author(s):  
Christian Stelling ◽  
Markus Retsch
Keyword(s):  
Liquid Interfaces ◽  
Free Standing ◽  
Metal Insulator ◽  
Metal Insulator Metal ◽  
Hole Arrays

Fabrication of free-standing subwavelength metal–insulator–metal gratings using high-aspect-ratio nanoimprint techniques

2016 ◽  
Vol 55 (6S1) ◽  
pp. 06GP20 ◽  
Author(s):  
Hiroaki Honma ◽  
Masato Mitsudome ◽  
Shintaro Itoh ◽  
Makoto Ishida ◽  
Kazuaki Sawada ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Free Standing ◽  
Metal Insulator ◽  
Metal Insulator Metal ◽  
Metal Gratings

Modeling, Fabrication, and Electrical Testing of Metal-Insulator-Metal Diode

2011 ◽  
Author(s):  
Terrance O'Regan ◽  
Matthew Chin ◽  
Cheng Tan ◽  
Anthony Birdwell
Keyword(s):  
Metal Insulator ◽  
Metal Insulator Metal

scholarly journals Hyperspectral Molecular Orientation Mapping in Metamaterials

2021 ◽  
Vol 11 (4) ◽  
pp. 1544
Author(s):  
Meguya Ryu ◽  
Yoshiaki Nishijima ◽  
Shinya Morimoto ◽  
Naoki To ◽  
Tomoki Hashizume ◽  
...  
Keyword(s):  
Molecular Orientation ◽  
Field Enhancement ◽  
Chemical Mapping ◽  
Metal Insulator ◽  
Orientation Mapping ◽  
Metal Insulator Metal ◽  
Finger Printing ◽  
Thermal Emitter ◽  
Ir Bands ◽  
Sub Wavelength

The four polarisation method is adopted for measurement of molecular orientation in dielectric nanolayers of metal-insulator-metal (MIM) metamaterials composed of gold nanodisks on polyimide and gold films. Hyperspectral mapping at the chemical finger printing spectral range of 4–20 μμm was carried out for MIM patterns of 1–2.5 μμm period (sub-wavelength). Overlay images taken at 0,π4,π2,3π4 orientation angles and subsequent baseline compensation are shown to be critically important for the interpretation of chemical mapping results and reduction of spurious artefacts. Light field enhancement in the 60-nm-thick polyimide (I in MIM) was responsible for strong absorption at the characteristic polyimide bands. Strong absorbance A at narrow IR bands can be used as a thermal emitter (emittance E=1−R), where R is the reflectance and A=1−R−T, where for optically thick samples the transmittance is T=0.

Nonstoichiometric Nanolayered Ni/NiO/Al2O3/CrAu Metal–Insulator–Metal Infrared Rectenna

2021 ◽  
Vol 4 (3) ◽  
pp. 2470-2475 ◽  
Author(s):  
Ayendra Weerakkody ◽  
Amina Belkadi ◽  
Garret Moddel
Keyword(s):  
Metal Insulator ◽  
Metal Insulator Metal

scholarly journals Design of a Liquid-Crystal-Tunable Terahertz Demultiplexer Based on a Metal-Insulator-Metal Waveguide

2019 ◽  
Vol 9 (4) ◽  
pp. 644
Author(s):  
Xue-Shi Li ◽  
Naixing Feng ◽  
Yuan-Mei Xu ◽  
Liang-Lun Cheng ◽  
Qing Liu
Keyword(s):  
Liquid Crystal ◽  
Electric Field ◽  
Metal Insulator ◽  
Resonance Modes ◽  
External Bias ◽  
Bias Electric Field ◽  
Metal Waveguide ◽  
Metal Insulator Metal ◽  
Fabry Perot ◽  
Mim Waveguide

A tunable demultiplexer with three output channels infiltrated by liquid crystal (LC) is presented, which is based on a metal-insulator-metal (MIM) waveguide. The operating frequencies of the three output channels can be tuned simultaneously at will by changing the external bias electric field applied to the LC. By analyzing the Fabry-Pérot (FP) resonance modes of the finite-length MIM waveguide both theoretically and numerically, the locations of the three channels are delicately determined to achieve the best demultiplexing effects. Terahertz (THz) signals input from the main channel can be demultiplexed by channels 1, 2 and 3 at 0.7135 THz, 1.068 THz and 1.429 THz, respectively. By applying an external electric field to alter the tilt angle of the infiltrating LC material, the operating frequencies of channels 1, 2 and 3 can be relatively shifted up to 12.3%, 9.6% and 9.7%, respectively. The designed demultiplexer can not only provide a flexible means to demultiplex signals but also tune operating bands of output channels at the same time.

Sign in / Sign up

Export Citation Format

Share Document