Ultralow Loading (Single‐Atom and Clusters) of the Pt Catalyst by Atomic Layer Deposition Using Dimethyl ((3,4‐η) N , N ‐dimethyl‐3‐butene‐1‐amine‐ N ) Platinum (DDAP) on the High‐Surface‐Area Substrate for Hydrogen Evolution Reaction

2020 ◽  
pp. 2001508
Author(s):  
Rahul Ramesh ◽  
Seungmin Han ◽  
Dip K. Nandi ◽  
Sandesh Y. Sawant ◽  
Deok Hyun Kim ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Surface Area ◽  
Hydrogen Evolution ◽  
Hydrogen Evolution Reaction ◽  
High Surface ◽  
High Surface Area ◽  
Atomic Layer ◽  
Single Atom ◽  
Pt Catalyst ◽  
Layer Deposition

High-Surface Area Ceria-Zirconia Films Prepared by Atomic Layer Deposition

2017 ◽  
Vol 147 (6) ◽  
pp. 1464-1470 ◽  
Author(s):  
Tzia Ming Onn ◽  
Sheng Dai ◽  
Jiayao Chen ◽  
Xiaoqing Pan ◽  
George W. Graham ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Surface Area ◽  
High Surface ◽  
High Surface Area ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Zirconia Films

Smart Pd Catalyst with Improved Thermal Stability Supported on High-Surface-Area LaFeO3Prepared by Atomic Layer Deposition

2018 ◽  
Vol 140 (14) ◽  
pp. 4841-4848 ◽  
Author(s):  
Tzia Ming Onn ◽  
Matteo Monai ◽  
Sheng Dai ◽  
Emiliano Fonda ◽  
Tiziano Montini ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Atomic Layer Deposition ◽  
Surface Area ◽  
High Surface ◽  
High Surface Area ◽  
Atomic Layer ◽  
Pd Catalyst ◽  
Layer Deposition

scholarly journals Toolbox for atomic layer deposition process development on high surface area powders

2021 ◽  
Vol 92 (2) ◽  
pp. 025115
Author(s):  
K. Knemeyer ◽  
R. Baumgarten ◽  
P. Ingale ◽  
R. Naumann d’Alnoncourt ◽  
M. Driess ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Surface Area ◽  
Process Development ◽  
High Surface ◽  
High Surface Area ◽  
Atomic Layer ◽  
Deposition Process ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

scholarly journals Surface modification and functionalization of powder materials by atomic layer deposition: a review

RSC Advances ◽  
2021 ◽  
Vol 11 (20) ◽  
pp. 11918-11942
Author(s):  
Yiyun Hu ◽  
Jian Lu ◽  
Hao Feng
Keyword(s):  
Surface Modification ◽  
Atomic Layer Deposition ◽  
Surface Area ◽  
High Surface ◽  
High Surface Area ◽  
Atomic Layer ◽  
Atomic Level ◽  
Powder Materials ◽  
Layer Deposition ◽  
Limiting Surface

Atomic layer deposition is a technique where gaseous precursors are used to form materials via self-limiting surface reactions. This allows conformal deposition materials on a high surface area support at the atomic level, and materials can by precisely constructed.

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