Ultralow Loading (Single‐Atom and Clusters) of the Pt Catalyst by Atomic Layer Deposition Using Dimethyl ((3,4‐η) N , N ‐dimethyl‐3‐butene‐1‐amine‐ N ) Platinum (DDAP) on the High‐Surface‐Area Substrate for Hydrogen Evolution Reaction

2020 ◽  
pp. 2001508
Author(s):  
Rahul Ramesh ◽  
Seungmin Han ◽  
Dip K. Nandi ◽  
Sandesh Y. Sawant ◽  
Deok Hyun Kim ◽  
...  
2020 ◽  
Vol 38 (6) ◽  
pp. 062201
Author(s):  
Shashank Balasubramanyam ◽  
Matthew A. Bloodgood ◽  
Yue Zhang ◽  
Marcel A. Verheijen ◽  
Wilhelmus M. M. Kessels ◽  
...  

2008 ◽  
Vol 516 (18) ◽  
pp. 6158-6166 ◽  
Author(s):  
J.A. Libera ◽  
J.W. Elam ◽  
M.J. Pellin

2017 ◽  
Vol 147 (6) ◽  
pp. 1464-1470 ◽  
Author(s):  
Tzia Ming Onn ◽  
Sheng Dai ◽  
Jiayao Chen ◽  
Xiaoqing Pan ◽  
George W. Graham ◽  
...  

2018 ◽  
Vol 140 (14) ◽  
pp. 4841-4848 ◽  
Author(s):  
Tzia Ming Onn ◽  
Matteo Monai ◽  
Sheng Dai ◽  
Emiliano Fonda ◽  
Tiziano Montini ◽  
...  

2021 ◽  
Vol 92 (2) ◽  
pp. 025115
Author(s):  
K. Knemeyer ◽  
R. Baumgarten ◽  
P. Ingale ◽  
R. Naumann d’Alnoncourt ◽  
M. Driess ◽  
...  

RSC Advances ◽  
2021 ◽  
Vol 11 (20) ◽  
pp. 11918-11942
Author(s):  
Yiyun Hu ◽  
Jian Lu ◽  
Hao Feng

Atomic layer deposition is a technique where gaseous precursors are used to form materials via self-limiting surface reactions. This allows conformal deposition materials on a high surface area support at the atomic level, and materials can by precisely constructed.


2015 ◽  
Vol 33 (1) ◽  
pp. 01A130 ◽  
Author(s):  
Joel W. Clancey ◽  
Andrew S. Cavanagh ◽  
Ratandeep S. Kukreja ◽  
Anusorn Kongkanand ◽  
Steven M. George

Sign in / Sign up

Export Citation Format

Share Document