scholarly journals Toolbox for atomic layer deposition process development on high surface area powders

2021 ◽  
Vol 92 (2) ◽  
pp. 025115
Author(s):  
K. Knemeyer ◽  
R. Baumgarten ◽  
P. Ingale ◽  
R. Naumann d’Alnoncourt ◽  
M. Driess ◽  
...  
2017 ◽  
Vol 147 (6) ◽  
pp. 1464-1470 ◽  
Author(s):  
Tzia Ming Onn ◽  
Sheng Dai ◽  
Jiayao Chen ◽  
Xiaoqing Pan ◽  
George W. Graham ◽  
...  

2018 ◽  
Vol 140 (14) ◽  
pp. 4841-4848 ◽  
Author(s):  
Tzia Ming Onn ◽  
Matteo Monai ◽  
Sheng Dai ◽  
Emiliano Fonda ◽  
Tiziano Montini ◽  
...  

RSC Advances ◽  
2021 ◽  
Vol 11 (20) ◽  
pp. 11918-11942
Author(s):  
Yiyun Hu ◽  
Jian Lu ◽  
Hao Feng

Atomic layer deposition is a technique where gaseous precursors are used to form materials via self-limiting surface reactions. This allows conformal deposition materials on a high surface area support at the atomic level, and materials can by precisely constructed.


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