Laser ablation of lanthanum phosphate for pulsed laser deposition

A modified pulsed laser deposition (PLD) was employed to deposit GaAs nanocrystals on the surface of PMMA microspheres. This novel approach is distinguished by the fact that laser ablated materials are deposited uniformly onto the surface of spherical particles that are held constantly in a particle fludization unit. The XRD, SEM, EDX, TEM, EDP and PL results confirmed that cubic structured GaAs nanocrystals were deposited uniformly on the surface of PMMA microspheres with an average diameter of about 15 nm.

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THE TARGET MORPHOLOGY DURING PULSED LASER DEPOSITION OF HYDROXYAPATITE THIN FILMS

Surface Review and Letters ◽

10.1142/s0218625x05007384 ◽

2005 ◽

Vol 12 (04) ◽

pp. 539-543 ◽

Cited By ~ 2

Author(s):

QUANHE BAO ◽

CHUANZHONG CHEN ◽

LUBIN CHEN ◽

DIANGANG WANG ◽

TINGQUAN LEI ◽

...

Keyword(s):

Thin Films ◽

Laser Ablation ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

The Other ◽

Laser Deposition ◽

Grain Structure ◽

Before And After ◽

Modified Surface ◽

Modified Surface Layer

A modified surface layer of hydroxyapatite (HA) target was observed before and after pulsed laser deposition. Two types of HA targets were used for laser ablation. We observed that the surface morphology of the target has a very fine compacted grain structure and presents many irregularities with some microroughness and microporosity before laser ablation. The laser ablated regions can be divided into two areas: one area is porous and rough but the other is dense and smooth. The percentage of particles in the films was high for the films produced with targets that were sintered at 1200°C.

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Dynamics of Transient Plasmas Generated by ns Laser Ablation of Memory Shape Alloys

10.5772/intechopen.94748 ◽

2020 ◽

Author(s):

Stefan Andrei Irimiciuc ◽

Norina Forna ◽

Andrei Agop ◽

Maricel Agop ◽

Stefan Toma ◽

...

Keyword(s):

Laser Ablation ◽

Pulsed Laser Deposition ◽

Emission Spectroscopy ◽

Pulsed Laser ◽

Optical Emission ◽

Laser Deposition ◽

Global Dynamics ◽

Time Resolved ◽

Laser Ablation Process ◽

Key Techniques

Understanding the underline fundamental mechanism behind experimental and industrial technologies embodies one of the foundations of the advances and tailoring new materials. With the pulsed laser deposition being one of the key techniques for obtaining complex biocompatible materials with controllable stoichiometry, there is need for experimental and theoretical advancements towards understanding the dynamics of multi component plasmas. Here we investigate the laser ablation process on Cu-Mn-Al and Fe-Mn-Si by means of space-and time-resolved optical emission spectroscopy and fast camera imaging. In a fractal paradigm the space–time homographic transformations were correlated with the global dynamics of the ablation plasmas.

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Ybco Films and Buffer‐Layers Grown In‐Situ by Pulsed Laser Deposition

MRS Proceedings ◽

10.1557/proc-169-485 ◽

1989 ◽

Vol 169 ◽

Cited By ~ 2

Author(s):

G. A. N. Connell ◽

D. B. Fenner ◽

D. K. Fork ◽

J.B. Boyce ◽

F.A. Ponce ◽

...

Keyword(s):

Laser Ablation ◽

Electrical Properties ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Buffer Layers ◽

Laser Deposition ◽

Ybco Films ◽

Structural And Electrical Properties

AbstractYSZ [ (Y2O3)x (ZrO2)1‐x ] buffer‐layers for various compositions, x, and YBCO (Y1Ba2Cu3O7‐δ) films were grown on hydrogen‐terminated Si(100) substrates by laser ablation. The structural and electrical properties of the YBCO are found to depend strongly on x, and to be optimized near x=0.1.

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In vacuo Pulsed Laser Ablation of YBa2Cu3O7–x Target for the Formation of Y2O3 Nanostructures

Journal of Materials Research ◽

10.1557/jmr.2002.0099 ◽

2002 ◽

Vol 17 (3) ◽

pp. 697-700 ◽

Cited By ~ 3

Author(s):

D. B. Jan ◽

Q. X. Jia ◽

M. E. Hawley ◽

G. W. Browne ◽

C. J. Wetteland ◽

...

Keyword(s):

Laser Ablation ◽

Substrate Temperature ◽

Pulsed Laser Deposition ◽

Three Dimensional ◽

Pulsed Laser ◽

Pulsed Laser Ablation ◽

Laser Deposition ◽

Growth Surface ◽

Planar Growth

The formation of superconducting YBa2Cu3O7–x (Y123) by in situ pulsed laser deposition from a stoichiometric Y123 target typically requires an oxygen-ambient environment (P ˜ 100–300-mtorr O2) and appropriate substrate temperature during deposition. We have found that pulsed laser deposition from a Y123 target in vacuo onto a (001) LaAlO3 substrate favors the formation of Y2O3. We observed that the Y2O3 (001) films yield three-dimensional nanoscale morphologies that are markedly different from the planar growth surface of conventional superconducting c-axis Y123 films and Y2O3 films formed from the pulsed laser ablation of a Y2O3 target.

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Pulsed Laser Deposition of Doped Lanthanum Gallate and In Situ Analysis by Mass Spectrometry of the Laser Ablation Plume

Chemistry of Materials ◽

10.1021/cm990341f ◽

2000 ◽

Vol 12 (4) ◽

pp. 917-922 ◽

Cited By ~ 25

Author(s):

Tom Mathews ◽

J. R. Sellar ◽

B. C. Muddle ◽

P. Manoravi

Keyword(s):

Mass Spectrometry ◽

Laser Ablation ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Ablation Plume ◽

Laser Deposition ◽

In Situ Analysis ◽

Lanthanum Gallate

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Preparation of Line Patterned Mesoporous DAM-1 Thin Films via Pulsed Laser Deposition

MRS Proceedings ◽

10.1557/proc-704-w10.11.1 ◽

2001 ◽

Vol 704 ◽

Author(s):

Decio Coutinho ◽

Kenneth J. Balkus

Keyword(s):

Thin Films ◽

Laser Ablation ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Laser Deposition ◽

Laser Printer ◽

Transparent Film ◽

Patterned Substrate ◽

Mesoporous Film ◽

Patterning Technique

AbstractPatterned mesoporous DAM-1 thin films were prepared on flexible transparent film utilizing the pulsed laser deposition and a line patterning technique. The patterned lines are transferred to the transparent film using a laser printer or copy machine. Laser ablation of DAM-1 onto the patterned substrate followed by a hydrothermal treatment resulted in a densely packed mesoporous film. Upon removal of the patterned lines (i.e. the underlying toner) by ultrasonic treatment in toluene, patterned DAM-1 films were produced.

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Performance and Mechanism of Photoelectrocatalytic Activity of MoSx/WO3 Heterostructures Obtained by Reactive Pulsed Laser Deposition for Water Splitting

Nanomaterials ◽

10.3390/nano10050871 ◽

2020 ◽

Vol 10 (5) ◽

pp. 871

Author(s):

Vyacheslav Fominski ◽

Roman Romanov ◽

Dmitry Fominski ◽

Alexey Soloviev ◽

Oxana Rubinkovskaya ◽

...

Keyword(s):

Laser Ablation ◽

Pulsed Laser Deposition ◽

Energy Band ◽

Active Sites ◽

Pulsed Laser ◽

Photocurrent Density ◽

Laser Deposition ◽

Electron Hole ◽

Glass Substrates ◽

Catalytically Active

This work studies the factors that affect the efficiency of the photoelectrochemical hydrogen evolution reaction (HER) using MoSx/WO3 nano-heterostructures obtained by reactive pulsed laser deposition (RPLD) on glass substrates covered with fluorinated tin oxide (FTO). Another focus of the research is the potential of MoSx nanofilms as a precursor for MoOz(S) nanofilms, which enhance the efficiency of the photo-activated oxygen evolution reaction (OER) using the MoOz(S)/WO3/FTO heterostructures. The nanocrystalline WO3 film was created by laser ablation of a W target in dry air at a substrate temperature of 420 °C. Amorphous MoSx nanofilms (2 ≤ x ≤ 12) were obtained by laser ablation of an Mo target in H2S gas of varied pressure at room temperature of the substrate. Studies of the energy band structures showed that for all MoSx/WO3/FTO samples, photo-activated HER in an acid solution proceeded through the Z-scheme. The highest photoelectrochemical HER efficiency (a photocurrent density ~1 mA/cm2 at a potential of ~0 V under Xe lamp illumination (~100 mW/cm2)) was found for porous MoS4.5 films containing the highest concentration of catalytically active sites attributed to S ligands. During the anodic posttreatment of porous MoSx nanofilms, MoOz(S) films with a narrow energy band gap were formed. The highest OER efficiency (a photocurrent density ~5.3 mA/cm2 at 1.6 V) was detected for MoOz(S)/WO3/FTO photoanodes that were prepared by posttreatment of the MoSx~3.2 precursor. The MoOz(S) film contributed to the effective photogeneration of electron–hole pairs that was followed by the transport of photoelectrons from MoOz(S) into the WO3 film and the effective participation of holes possessing strong oxidation ability in the OER on the surface of the MoOz(S) film.

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