Low Temperature Deposition of Antibacterially Active Silicon Oxide Layers Containing Silver Nanoparticles, Prepared by Atmospheric Pressure Plasma Chemical Vapor Deposition

2012 ◽  
Vol 10 (1) ◽  
pp. 77-87 ◽  
Author(s):  
Oliver Beier ◽  
Andreas Pfuch ◽  
Kerstin Horn ◽  
Jürgen Weisser ◽  
Matthias Schnabelrauch ◽  
...  
Keyword(s):  
Silver Nanoparticles ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Silicon Oxide ◽  
Atmospheric Pressure Plasma ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Temperature Deposition

Characterization of Epitaxial Si Films Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition Using Cylindrical Rotary Electrode

2006 ◽  
Vol 45 (4B) ◽  
pp. 3592-3597 ◽  
Author(s):  
Kiyoshi Yasutake ◽  
Hiromasa Ohmi ◽  
Hiroaki Kakiuchi ◽  
Takuya Wakamiya ◽  
Heiji Watanabe
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Pressure Plasma ◽  
Si Films

Synthesis of carbon clusters and thin films by low temperature plasma chemical vapor deposition under atmospheric pressure

1996 ◽  
Vol 68 (5) ◽  
pp. 1151-1154 ◽  
Author(s):  
H. Koinuma ◽  
Takao Horiuchi ◽  
Kiyoto Inomata ◽  
H.-K. Ha ◽  
K. Nakajima ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Carbon Clusters ◽  
Low Temperature Plasma ◽  
Plasma Chemical ◽  
Temperature Plasma ◽  
Plasma Chemical Vapor Deposition
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