scholarly journals High-Rate Deposition of Amorphous SiC Films by Atmospheric Pressure Plasma Chemical Vapor Deposition. (1st Report). Examination of Deposition Rate and Film Structure.

2000 ◽  
Vol 66 (6) ◽  
pp. 907-911
Author(s):  
Yuzo MORI ◽  
Hiroaki KAKIUCHI ◽  
Kumayasu YOSHII ◽  
Kiyoshi YASUTAKE
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