Electron energy probability function modulation with external electron beam in capacitive coupled radio frequency discharges

2017 ◽  
Vol 15 (3) ◽  
pp. 1700169 ◽  
Author(s):  
Ya Zhang ◽  
Jia-long Huang ◽  
Lin Yi ◽  
Hong-yu Wang ◽  
Wei Jiang
2007 ◽  
Vol 91 (22) ◽  
pp. 221501 ◽  
Author(s):  
S. J. You ◽  
S. S. Kim ◽  
Jung-Hyung Kim ◽  
Dae-Jin Seong ◽  
Yong-Hyeon Shin ◽  
...  

2011 ◽  
Vol 497 ◽  
pp. 127-132 ◽  
Author(s):  
Hui Zhang ◽  
Takuro Tamura ◽  
You Yin ◽  
Sumio Hosaka

We have studied on theoretical electron energy deposition in thin resist layer on Si substrate for electron beam lithography. We made Monte Carlo simulation to calculate the energy distribution and to consider formation of nanometer sized pattern regarding electron energy, resist thickness and resist type. The energy distribution in 100 nm-thick resist on Si substrate were calculated for small pattern. The calculations show that 4 nm-wide pattern will be formed when resist thickness is less than 30 nm. Furthermore, a negative resist is more suitable than positive resist by the estimation of a shape of the energy distribution.


1997 ◽  
Vol 82 (5) ◽  
pp. 2060-2071 ◽  
Author(s):  
G. J. Nienhuis ◽  
W. J. Goedheer ◽  
E. A. G. Hamers ◽  
W. G. J. H. M. van Sark ◽  
J. Bezemer

1963 ◽  
Vol 19 (8) ◽  
pp. 1309-1317 ◽  
Author(s):  
R. Mavrodineanu ◽  
R.C. Hughes

2021 ◽  
Vol 16 (09) ◽  
pp. T09002
Author(s):  
S. Shrotriya ◽  
S. Mukherjee ◽  
S.S. Jena ◽  
A. Shiju ◽  
N. Patel ◽  
...  

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