Suitability of Rare-Earth Oxides for Use in Thin Film Transistors

1987 ◽  
Vol 104 (2) ◽  
pp. 885-889 ◽  
Author(s):  
P. Singh ◽  
B. Baishya
2019 ◽  
Vol 493 ◽  
pp. 63-69 ◽  
Author(s):  
Jin-hua Ren ◽  
Yu-ting Huang ◽  
Kai-wen Li ◽  
Jie Shen ◽  
Wan-yu Zeng ◽  
...  

2012 ◽  
Vol 159 (5) ◽  
pp. H502-H506 ◽  
Author(s):  
Dongxiang Luo ◽  
Linfeng Lan ◽  
Miao Xu ◽  
Hua Xu ◽  
Min Li ◽  
...  

1976 ◽  
Vol 3 (1) ◽  
pp. 51-62 ◽  
Author(s):  
A. T. Fromhold, Jr. ◽  
W. D. Foster

An experimental survey of rare earth oxides for use in thin film capacitors has been completed. Dielectric properties measured at 300°K are reported for thermally evaporated oxides 300 to 6000 Å in thickness of the metals, La, Ce, Pr, Nd, Sm, Gd, Dy, Ho, Er, Yb, Y, Sc, and also, V. Thin evaporated aluminum electrodes were utilized to impress voltages in the range zero to 75 V across the oxide layers. Dielectric breakdown strengths in excess of 5 × 106V/cm were observed. Relative dielectric constants measured for the oxides range from two to twenty, and measured capacitances were as high as 156 × 10−9F/cm2. The oxides of Ce, La, Nd, Gd, Pr, and Er show the most promise as potential materials for use in thin film capacitors.


Langmuir ◽  
2005 ◽  
Vol 21 (14) ◽  
pp. 6527-6531 ◽  
Author(s):  
Wei Su ◽  
Jianzhuang Jiang ◽  
Kai Xiao ◽  
Yanli Chen ◽  
Quanqin Zhao ◽  
...  

2006 ◽  
Vol 320 ◽  
pp. 69-72 ◽  
Author(s):  
Masao Kondo ◽  
Kazuaki Kurihara

The influence of a rare earth oxide/yttria-stabilized zirconia (YSZ) double buffer layer structure on the orientation of a perovskite thin film was investigated on (100) silicon substrates. A calcium titanate perovskite film with a mixture of (110) and (100) orientation was grown epitaxially on a YSZ buffer layer. Since rare earth oxides have almost the same chemical nature and different lattice parameters, it is anticipated that the lattice parameter of the buffer layer can be controlled by changing the rare earth element. An (100) oriented epitaxial calcium titanate film was obtained by changing the composition of rare earth oxides on the YSZ/Si substrate.


1999 ◽  
Vol 337 (1-2) ◽  
pp. 113-117 ◽  
Author(s):  
Toshiaki Arai ◽  
Hiroshi Takatsuji ◽  
Hideo Iiyori

2010 ◽  
Vol 2 (2) ◽  
pp. 214-220 ◽  
Author(s):  
D. Saikia ◽  
R. Sarma ◽  
P. Saikia ◽  
P. K. Saikia

Tetracene thin film transistors with rare earth oxide (Nd2O3) as gate dielectric is reported in this work. Rare earth oxide with high dielectric constant and low leakage current improve the performance of the organic thin film transistors (OTFTs). The fabricated tetracene OTFTs have shown good output characteristics with mobility 0.93x10-4 cm2/V.s, ON-OFF ratio 3.3x102, sub-threshold swing 0.06 V/decade and hole concentration 8.74x1017 cm-3. Keywords: Organic thin film transistors; Tetracene; Rare earth oxide; Trap density. © 2010 JSR Publications. ISSN: 2070-0237 (Print); 2070-0245 (Online). All rights reserved. DOI: 10.3329/jsr.v2i2.4094               J. Sci. Res. 2 (2), 214-220 (2010) 


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