32-3: Stability Enhancement of Light Emitting Diode Based on Quantum Dots through Atomic Layer Deposition

2017 ◽  
Vol 48 (1) ◽  
pp. 455-458 ◽  
Author(s):  
Rui Lu ◽  
Wei Chen ◽  
Yulong Chen ◽  
Lei Yang ◽  
Junjie Hao ◽  
...  
2016 ◽  
Vol 18 (2) ◽  
pp. 1042-1049 ◽  
Author(s):  
Lae Ho Kim ◽  
Yong Jin Jeong ◽  
Tae Kyu An ◽  
Seonuk Park ◽  
Jin Hyuk Jang ◽  
...  

The shelf-life of the OLED devices passivated with and without PEALD-based films at 60 °C and 90% RH.


2011 ◽  
Vol 04 (03) ◽  
pp. 221-224 ◽  
Author(s):  
W. C. LI ◽  
H. L. TSAI ◽  
H. C. CHEN ◽  
M. K. WU ◽  
H. R. CHEN ◽  
...  

Electron microscopy investigation has been carried for an n- ZnO /p- GaN:Mg heterojunction ultraviolet (UV) light-emitting diode device, where the n- ZnO layer was grown by atomic layer deposition on the p-type GaN:Mg /undoped GaN structure prepared on c- Al 2 O 3 substrate. Threading dislocations, formed at the interface of the GaN/Al2O3 , disappeared at the interface of n- ZnO /p- GaN during post-deposited rapid thermal annealing and accordingly the n- ZnO layer became an almost perfect single crystal including only a few surviving dislocations. An interfacial layer was found along the (0001) interface between the n- ZnO and p- GaN:Mg layers. Scanning transmission microscopy analysis revealed that the interfacial layer was composed of ZnO crystal, which connected coherently with the neighboring n- ZnO and p- GaN:Mg . This interfacial layer contained a few atomic percents of Mg , the atoms of which had been diffused from the p- GaN:Mg . The high quality crystalline n- ZnO and the interfacial layer forming a ZnO/GaN interface states are responsible for the UV electroluminescence from the ZnO .


2021 ◽  
Vol 546 ◽  
pp. 149086
Author(s):  
Xiangping Pan ◽  
Yanhua Dong ◽  
Ming Jia ◽  
Jianxiang Wen ◽  
Caiyun Su ◽  
...  

2019 ◽  
Vol 125 ◽  
pp. 281-286 ◽  
Author(s):  
Wen Zhou ◽  
Li Zheng ◽  
Xinhong Cheng ◽  
Wenjia Zhou ◽  
Peiyi Ye ◽  
...  

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