The influence of the compressive and tensile stresses forming in the nanostructured Ti–Al–N coatings during deposition on their physical-mechanical properties was studied. The modifying influence of metal components (Ni and Cu) introduction into Ti–Al–N coatings, which do not interact with nitrogen and have limited solubility with the nitride phase, was also under research. Coatings were deposited on WC–(6 wt.%)Co carbide cutting inserts with an arc-PVD method using a cathodic vacuum arc evaporation apparatus. The introduction of Ni and Cu to the composition leads to the reduction of nitride phases grain size in both investigated coatings from 120 to 10–12 nm for Ti–Al–Cu–N and to 15–18 nm for Ti–Al–Ni–N. Thus, the hardness increases from 29 to 43 and 51 GPa for the mentioned above coatings, respectively. Meanwhile, Ti–Al–Cu–N and Ti–Al–Ni–N coatings are characterized by tensile stresses about 0.12–0.32 MPa against the much higher value of compressive stresses in Ti–Al–N coatings (4.29–5.31 GPa). The modification of Ti–Al–N coatings also leads to the changing of their destruction mechanism during the scratch-test. The critical loads characterizing the emergence of the first cracks in the coatings and complete abrasion of the coating (Lc1 and Lc3) were determined. They had the value of 20; 22 N (Lc1) and 64; 57 N (Lc3) for Ti–Al–Ni–N; Ti–Al–Cu–N coatings, respectively. The Lc1 parameter for Ti–Al–N coatings was much lower and was equal to 11 N. Along with those, Ti–Al–N coatings destructed according to the adhesion mechanism when the critical load was 35 N. In addition, the decreasing level of compressive stresses in Ti–Al–Cu–N and Ti–Al–Ni–N coatings as compared to that in the Ti–Al–N coating, their crack resistance during multi-cycle shock-dynamic impact test was significantly higher. The results can indicate that high hardness and crack resistance of the coatings is to a greater extent determined by coatings nanostructuring, not the stresses value. In addition, it confirms the possibility to obtain coatings with low stresses value while maintaining their superhardness.
Вольт-амперные характеристики начальной стадии дугового разряда в высоковольтном вакуумном диоде
