Sige:H Thin Films Prepared by Plasma Assisted Reactive Thermal Chemical Vapor Deposition
2008 ◽
pp. 1252-1256
2013 ◽
Vol 52
(11S)
◽
pp. 11NL02
◽
2005 ◽
Vol 23
(6)
◽
pp. 2340
◽
Thermal Chemical Vapor Deposition of Bis(Tertiary-Butylamino)Silane-based Silicon Nitride Thin Films
2005 ◽
Vol 152
(4)
◽
pp. G316
◽
2010 ◽
Vol 49
(5)
◽
pp. 050207
◽