Plasma-Enhanced Chemical Vapor Deposition of FSG and a-C:F Low-k Materials

2003 ◽  
pp. 121-166
Author(s):  
K. Endo ◽  
K. Kishimoto ◽  
Y. Matsubara ◽  
K. Koyanagi
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low K

Wafer level microarcing model in 90nm chemical-vapor deposition low-k via etch on 300mm silicon-on-insulator substrate

2006 ◽  
Vol 24 (4) ◽  
pp. 1404-1409 ◽  
Author(s):  
Hai Cong ◽  
Chun Hui Low ◽  
Yelehanka Ramachandramurthy Pradeep ◽  
Xin Zhang ◽  
Perera Chandima ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Silicon On Insulator ◽  
Wafer Level ◽  
Low K ◽  
Insulator Substrate

Low-k SiCOH Films Deposited with a Single Precursor 1,1,1,3,5,7,7,7 Octamethyl-3,5-Bis(trimethylsiloxy) Tetrasiloxane by Plasma Enhanced Chemical Vapor Deposition

2020 ◽  
Vol 20 (4) ◽  
pp. 2301-2307
Author(s):  
Sungyool Kwon ◽  
Yoonsoo Park ◽  
Wonjin Ban ◽  
Younghyun Kim ◽  
Junyoung Jang ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Single Precursor ◽  
Low K

Study of oxygen influences on carbon doped silicon oxide low k thin films deposited by plasma enhanced chemical vapor deposition

2004 ◽  
Vol 96 (1) ◽  
pp. 829-834 ◽  
Author(s):  
M. R. Wang ◽  
Rusli ◽  
J. L. Xie ◽  
N. Babu ◽  
C. Y. Li ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Silicon Oxide ◽  
Chemical Vapor ◽  
Carbon Doped ◽  
Doped Silicon ◽  
Low K

Plasma Enhanced Chemical Vapor Deposition of Manganese on Low-k Dielectrics for Copper Diffusion Barrier Application

2012 ◽  
Vol 2 (3) ◽  
pp. P25-P27 ◽  
Author(s):  
N. Jourdan ◽  
Y. Barbarin ◽  
K. Croes ◽  
Y. Kong Siew ◽  
S. Van Elshocht ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Diffusion Barrier ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Copper Diffusion ◽  
Low K
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