Effects of Post-deposition Annealing Time in Nitrogen Ambient on Y2O3 Films Deposited on Silicon
2014 ◽
Vol 18
(sup6)
◽
pp. S6-495-S6-498
◽
2020 ◽
Vol 1535
◽
pp. 012031
2014 ◽
Vol 18
(sup6)
◽
pp. S6-490-S6-494
◽
2020 ◽
Vol 8
◽
pp. 970-975
◽
2005 ◽
Vol 20
(5)
◽
pp. 464-468
◽
Keyword(s):
Keyword(s):