Effects of post-deposition annealing time in oxygen ambient on Y2O3 film deposited on silicon substrate
2014 ◽
Vol 18
(sup6)
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pp. S6-495-S6-498
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2020 ◽
Vol 1535
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pp. 012031
2011 ◽
Vol 14
(2)
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pp. 101-107
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2011 ◽
Vol 22
(12)
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pp. 1816-1826
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Keyword(s):
2012 ◽
Vol 535-537
◽
pp. 362-367
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2014 ◽
Vol 18
(sup6)
◽
pp. S6-490-S6-494
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2020 ◽
Vol 8
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pp. 970-975
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2005 ◽
Vol 20
(5)
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pp. 464-468
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