Parametric study of atmospheric-pressure diamond synthesis with an inductively coupled plasma torch

1993 ◽  
Vol 13 (3) ◽  
pp. 433-446 ◽  
Author(s):  
T. G. Owano ◽  
C. H. Kruger
2020 ◽  
Vol 20 (1) ◽  
pp. 196-204
Author(s):  
Hohyun Song ◽  
Yun-Seong Lee ◽  
Geunjae Kwak ◽  
Hong-Young Chang

Carbon ◽  
1990 ◽  
Vol 28 (6) ◽  
pp. 748-750 ◽  
Author(s):  
T.G. Owano ◽  
C.H. Kruger ◽  
M.A. Cappelli

1990 ◽  
Vol 5 (11) ◽  
pp. 2326-2333 ◽  
Author(s):  
M. A. Cappelli ◽  
T. G. Owano ◽  
C. H. Kruger

A study of diamond synthesis in an atmospheric pressure inductively coupled argon-hydrogen-methane plasma is presented. The plasma generated has an active area of 20 cm2 and a free stream temperature of approximately 5000 K. Deposition experiments lasting 1 h in duration have been performed in both stagnation flow and flat plate parallel flow geometries. The diamond film deposited in both configurations are nonuniform yet fairly reproducible. The variation in the growth rates at various regions of the substrate is attributed to the variation in the surface atomic hydrogen flux. Growth rates are as high as 50 μm/h, in regions of the substrate where the atomic hydrogen flux is expected to be large. Little or no growth is observed in regions where the atomic hydrogen is expected to recombine within the thermal boundary layer before arriving at the surface. Individual particles are analyzed by micro-Raman spectroscopy. Large (50 μm) size well-faceted particles show little evidence of non-diamond carbon content and are found to be under a state of compression, displaying shifts in the principal phonon mode as great as 3 cm−1.


2014 ◽  
Vol T161 ◽  
pp. 014008 ◽  
Author(s):  
Hanene Bahouh ◽  
Saida Rebiai ◽  
David Rochette ◽  
Damien Vacher ◽  
Michel Dudeck

1987 ◽  
Vol 41 (4) ◽  
pp. 654-657 ◽  
Author(s):  
Thomas R. Smith ◽  
M. Bonner Denton

An inductively coupled plasma (ICP) torch utilizing an extended coolant tube that tapers down to a small exit orifice designed to increase the pressure within the ICP torch is described. This torch design makes use of the advantages associated with higher torch operating pressures (including improved detection limits, increased sensitivity, and better plasma stability), without requiring major modifications to existing commercially available ICP torch box and matching networks. Detection limits obtained with the use of the new torch design are compared with those obtained from several commonly used torch designs using a commercially available torch box and spectrometer. A two- to sevenfold improvement in detection limits is observed through increasing torch operating pressure from 101.325 KPa (760 Torr, or atmospheric pressure) to 120 KPa (900 Torr).


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