Reduction of the annealing temperature of radiation-induced defects in ion-implanted MOS structures
Keyword(s):
1990 ◽
Vol 48
(4)
◽
pp. 92-93
1986 ◽
Vol 47
(C8)
◽
pp. C8-1045-C8-1048
1994 ◽
Vol 33
(Part 2, No. 2B)
◽
pp. L233-L234
◽