The preparation of organic light-emitting diode encapsulation barrier layer by low-temperature plasma-enhanced chemical vapor deposition: a study on the $$\hbox {SiO}_\mathrm{x}\hbox {N}_\mathrm{y}$$ SiO x N y film parameter optimization
2014 ◽
Vol 27
(3)
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pp. 581-593
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2005 ◽
Vol 44
(4A)
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pp. 1923-1927
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High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes
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2006 ◽
Vol 10
(3)
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pp. 457-466
2001 ◽
Vol 40
(Part 1, No. 1)
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pp. 44-48
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2020 ◽
Vol 28
(10)
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pp. 808-824
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Keyword(s):
1989 ◽
Vol 39
(1-4)
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pp. 135-140
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1998 ◽
Vol 37
(Part 1, No. 12A)
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pp. 6562-6568
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2017 ◽
Vol 11
(1)
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pp. 226-233
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