Fabrication and Electrical Characterization of Ultrathin Crystalline Al2O3 Gate Dielectric Films on Si(100) and Si(111) by Molecular Beam Epitaxy
2002 ◽
Vol 41
(Part 2, No. 12B)
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pp. L1474-L1477
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Keyword(s):
2006 ◽
Vol 17
(9)
◽
pp. 685-688
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1991 ◽
pp. 669-674
1999 ◽
Vol 17
(4)
◽
pp. 1307-1312
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