Current-perpendicular-to-plane giant magnetoresistance in Co/Cu multilayered nanocylinders electrodeposited into anodized aluminum oxide nanochannels with ultra-large aspect ratio

2021 ◽  
Author(s):  
Tomomi Ide ◽  
Masamitsu Hayashida ◽  
Takeshi Ohgai
Keyword(s):  
Aspect Ratio ◽  
Aluminum Oxide ◽  
Giant Magnetoresistance ◽  
Large Aspect Ratio ◽  
Anodized Aluminum ◽  
Anodized Aluminum Oxide ◽  
Current Perpendicular To Plane

scholarly journals CPP-GMR of Co/Cu Multilayered Nanowires Electrodeposited into Anodized Aluminum Oxide Nanochannels with Large Aspect Ratio

2013 ◽  
Vol 50 (10) ◽  
pp. 201-206 ◽  
Author(s):  
T. Ohgai ◽  
N. Goya ◽  
Y. Zenimoto ◽  
K. Takao ◽  
M. Nakai ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
Aluminum Oxide ◽  
Large Aspect Ratio ◽  
Anodized Aluminum ◽  
Anodized Aluminum Oxide ◽  
Multilayered Nanowires

scholarly journals CPP-GMR Performance of Electrochemically Synthesized Co/Cu Multilayered Nanowire Arrays with Extremely Large Aspect Ratio

Nanomaterials ◽  
2019 ◽  
Vol 10 (1) ◽  
pp. 5
Author(s):  
Himeyo Kamimura ◽  
Masamitsu Hayashida ◽  
Takeshi Ohgai
Keyword(s):  
Aspect Ratio ◽  
Giant Magnetoresistance ◽  
Spin Diffusion ◽  
Nanowire Arrays ◽  
Diffusion Limit ◽  
Anodized Aluminum ◽  
Anodized Aluminum Oxide ◽  
Sputter Deposited ◽  
Multilayered Nanowires

Anodized aluminum oxide (AAO) films, which have numerous nanochannels ca. 75 nm in diameter, D and ca. 70 µm in length, L (ca. 933 in aspect ratio, L/D), were used as a template material for growing Co/Cu multilayered nanowire arrays. The multilayered nanowires with alternating Cu layer and Co layers were synthesized by using an electrochemical pulsed-potential deposition technique. The thickness of the Cu layer was adjusted from ca. 2 to 4 nm while that of the Co layer was regulated from ca. 13 to 51 nm by controlling the pulsed potential parameters. To get a Co/Cu multilayered nanowire in an electrochemical in-situ contact with a sputter-deposited Au thin layer, the pulsed potential deposition was continued up to ca. 5000 cycles until the nanowire reached out toward the surface of AAO template. Current-perpendicular-to-plane giant magnetoresistance (CPP-GMR) effect reached up to ca. 23.5% at room temperature in Co/Cu multilayered nanowires with ca. 3500 Co/Cu bilayers (Cu: 1.4 nm and Co: 18.8 nm). When decreasing the thickness of Co layer, the CPP-GMR value increased due to the Valet–Fert model in the long spin diffusion limit.

scholarly journals High-throughput fabrication of high aspect ratio Ag/Al nanopillars for optical detection of biomarkers

2021 ◽  
Author(s):  
Ainash Garifullina ◽  
Amy Q. Shen
Keyword(s):  
Aspect Ratio ◽  
Aluminum Oxide ◽  
High Throughput ◽  
High Aspect Ratio ◽  
Optical Detection ◽  
Anodized Aluminum ◽  
Anodized Aluminum Oxide ◽  
Specific Antibodies ◽  
Detection Of Biomarkers

Plasmonic polystyrene nanopillars are fabricated by using anodized aluminum oxide (AAO) membranes as templates, and successfully employed for detection of specific antibodies in the pM range.

FABRICATION OF POLYMER MASTER FOR ANTIREFLECTIVE SURFACE USING HOT EMBOSSING AND AAO PROCESS

2008 ◽  
Vol 22 (31n32) ◽  
pp. 5887-5894 ◽  
Author(s):  
HONG GUE SHIN ◽  
JONG TAE KWON ◽  
YOUNG HO SEO ◽  
BYEONG HEE KIM
Keyword(s):  
Aspect Ratio ◽  
Silicon Layer ◽  
Processing Parameters ◽  
Hot Embossing ◽  
Large Area ◽  
Anodized Aluminum ◽  
Simple Method ◽  
Anodized Aluminum Oxide ◽  
Coating Method ◽  
Automobile Components

A simple method for the fabrication of polymer master for antireflective surface is presented. In conventional fabrication methods for antireflective surface, coating method with low refractive index have usually been used. However, it is required to have a high cost and a long processing time for mass production. In this paper, antireflective surface was fabricated by using hot embossing process with porous anodized aluminum oxide. Through multi-AAO and etching processes, nano patterned master with high aspect ratio was fabricated at the large area. Size and aspect ratio of nano patterned master are about 175 ± 25 nm and 2 ~ 3, respectively. In order to replicate nano patterned master, hot embossing process was performed by varying the processing parameters such as temperature, pressure and embossing time etc. Finally, antireflective surface can be successfully obtained after etching process to remove selectively silicon layer of AAO master. Optical and rheological characteristics of antireflective surface were analyzed by using SEM, EDX and spectrometer inspection. Antireflective structure by replicating hot embossing process can be applied to various displays and automobile components.

Tuning the Composition and Nanostructure of Pt/Ir Films via Anodized Aluminum Oxide Templated Atomic Layer Deposition

2010 ◽  
Vol 20 (18) ◽  
pp. 3099-3105 ◽  
Author(s):  
David J. Comstock ◽  
Steven T. Christensen ◽  
Jeffrey W. Elam ◽  
Michael J. Pellin ◽  
Mark C. Hersam
Keyword(s):  
Atomic Layer Deposition ◽  
Aluminum Oxide ◽  
Atomic Layer ◽  
Anodized Aluminum ◽  
Anodized Aluminum Oxide ◽  
Layer Deposition
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